OPTICAL MODULE AND OPTICAL MODULATOR
    1.
    发明申请

    公开(公告)号:US20190162984A1

    公开(公告)日:2019-05-30

    申请号:US16174644

    申请日:2018-10-30

    IPC分类号: G02F1/01

    摘要: An optical modulator includes: an optical modulator chip having an optical waveguide having a bent waveguide portion that is bent between a light input end portion and a light output end portion, a bias electrode provided between the light input end portion and the bent waveguide portion along the optical waveguide, and a signal electrode provided between the bent waveguide portion and the light output end portion along the optical waveguide; a bias input terminal configured to input a bias voltage, the bias input terminal being electrically connected to the bias electrode, and a signal input terminal configured to input an electric signal, the signal input terminal being provided closer to a receiver configured to receive an electric signal than the bias input terminal and being electrically connected to the signal electrode.

    MODULATOR WITH SIGNAL ELECTRODE ENCLOSED BY GROUND ELECTRODE

    公开(公告)号:US20180252948A1

    公开(公告)日:2018-09-06

    申请号:US15973100

    申请日:2018-05-07

    摘要: A modulator may include a substrate. The modulator may include one or more waveguides formed upon or formed in the substrate. A signal electrode may be provided adjacent to at least one of the one or more waveguides and may include a curved outer surface. The modulator may include one or more ground electrodes provided adjacent to the signal electrode. Each ground electrode, of the one or more ground electrodes, may include a respective curved inner surface that is radially spaced from the curved outer surface of the signal electrode. The one or more ground electrodes and the substrate may at least substantially enclose the curved outer surface of the signal electrode.

    Optical atomic clock
    4.
    发明授权

    公开(公告)号:US09983550B2

    公开(公告)日:2018-05-29

    申请号:US15127197

    申请日:2015-03-18

    申请人: Oewaves, Inc.

    IPC分类号: G01V3/00 G04F5/14 G02F1/035

    CPC分类号: G04F5/14 G02F1/0356

    摘要: An optical atomic clock utilizing two different laser light sources is described. A source laser is locked to a first optical resonator, which supports a whispering gallery mode for the source laser and generates optical hyperparametric sidebands from the source laser output by multi-wave mixing. A reference laser is locked to an atomic reference via a second optical resonator, and the first optical resonator is locked to the reference laser. Optical parametric sidebands, which are locked to an atomic reference but are generated from a wavelength unrelated to the clock transition of the atomic reference, are coupled out of the first optical resonator to generate an RF signal useful in atomic timekeeping.

    ULTRA-RESPONSIVE PHASE SHIFTERS FOR DEPLETION MODE SILCON MODULATORS

    公开(公告)号:US20180143464A1

    公开(公告)日:2018-05-24

    申请号:US15876856

    申请日:2018-01-22

    摘要: A novel phase shifter design for carrier depletion based silicon modulators, based on an experimentally validated model, is described. It is believed that the heretofore neglected effect of incomplete ionization will have a significant impact on ultra-responsive phase shifters. A low VπL product of 0.3V·cm associated with a low propagation loss of 20 dB/cm is expected to be observed. The phase shifter is based on overlapping implantation steps, where the doses and energies are carefully chosen to utilize counter-doping to produce an S-shaped junction. This junction has a particularly attractive VπL figure of merit, while simultaneously achieving attractively low capacitance and optical loss. This improvement will enable significantly smaller Mach-Zehnder modulators to be constructed that nonetheless would have low drive voltages, with substantial decreases in insertion loss. The described fabrication process is of minimal complexity; in particular, no high-resolution lithographic step is required.

    Ultra-responsive phase shifters for depletion mode silcon modulators

    公开(公告)号:US09910302B2

    公开(公告)日:2018-03-06

    申请号:US15481669

    申请日:2017-04-07

    摘要: A novel phase shifter design for carrier depletion based silicon modulators, based on an experimentally validated model, is described. It is believed that the heretofore neglected effect of incomplete ionization will have a significant impact on ultra-responsive phase shifters. A low VπL product of 0.3V·cm associated with a low propagation loss of 20 dB/cm is expected to be observed. The phase shifter is based on overlapping implantation steps, where the doses and energies are carefully chosen to utilize counter-doping to produce an S-shaped junction. This junction has a particularly attractive VπL figure of merit, while simultaneously achieving attractively low capacitance and optical loss. This improvement will enable significantly smaller Mach-Zehnder modulators to be constructed that nonetheless would have low drive voltages, with substantial decreases in insertion loss. The described fabrication process is of minimal complexity; in particular, no high-resolution lithographic step is required.

    Ultra-responsive phase shifters for depletion mode silicon modulators

    公开(公告)号:US09638942B2

    公开(公告)日:2017-05-02

    申请号:US14840409

    申请日:2015-08-31

    摘要: A novel phase shifter design for carrier depletion based silicon modulators, based on an experimentally validated model, is described. It is believed that the heretofore neglected effect of incomplete ionization will have a significant impact on ultra-responsive phase shifters. A low VπL product of 0.3 V·cm associated with a low propagation loss of 20 dB/cm is expected to be observed. The phase shifter is based on overlapping implantation steps, where the doses and energies are carefully chosen to utilize counter-doping to produce an S-shaped junction. This junction has a particularly attractive VπL figure of merit, while simultaneously achieving attractively low capacitance and optical loss. This improvement will enable significantly smaller Mach-Zehnder modulators to be constructed that nonetheless would have low drive voltages, with substantial decreases in insertion loss. The described fabrication process is of minimal complexity; in particular, no high-resolution lithographic step is required.