公开(公告)号：US20130291798A1

公开(公告)日：2013-11-07

申请号：US13979462

申请日：2012-01-03

申请人： Ho-Young Lee ,  Sang-Joon Park ,  Jin-Pil Heo ,  Byung-Guk Son ,  Wook-Sang Jang ,  Kyung-Cheol Lee

发明人： Ho-Young Lee ,  Sang-Joon Park ,  Jin-Pil Heo ,  Byung-Guk Son ,  Wook-Sang Jang ,  Kyung-Cheol Lee

IPC分类号： C23C16/458

CPC分类号： C23C16/458 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/02538 ,  H01L21/0262 ,  H01L21/67346 ,  H01L21/68742 ,  H01L21/68764 ,  H01L21/68771 ,  Y10S901/43

摘要： The present invention relates to a thin film deposition apparatus and a substrate treatment system including same. The thin film deposition apparatus includes a deposition chamber, a susceptor, a rotation mechanism, an elevation member, and an elevation driving unit. The deposition chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the deposition chamber, and a plurality of substrates is seated on a top surface of the susceptor. The elevation member is disposed above the susceptor to support a portion of each side of the substrates seated on the susceptor. When the elevation member is operated, the substrates are separated from the susceptor or seated on the susceptor. The elevation driving unit elevates the elevation member.

摘要翻译： 本发明涉及一种薄膜沉积设备及其基片处理系统。 薄膜沉积设备包括沉积室，基座，旋转机构，升降构件和升降驱动单元。 沉积室具有进行沉积处理的内部空间。 基座设置在沉积室内，并且多个基板位于基座的顶表面上。 升降构件设置在基座上方以支撑安置在基座上的基板的每一侧的一部分。 当升降构件被操作时，基板与基座分离或者安置在基座上。 升降驱动单元升高升降构件。