公开(公告)号：US07286242B2

公开(公告)日：2007-10-23

申请号：US10489108

申请日：2002-09-23

申请人： Yeong Ryeol Kim ,  Ji Jong Park ,  Jin Yong Kim ,  Joong Whan Lee

发明人： Yeong Ryeol Kim ,  Ji Jong Park ,  Jin Yong Kim ,  Joong Whan Lee

IPC分类号： G01B9/02

CPC分类号： G01B11/0625

摘要： The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present invention, by employing more than one narrow band-pass optical filters and a two-dimensional array of CCD sensors, and by finding an optimal solution for the nonlinear functional relationship between the thickness of said thin film or thin films and the corresponding refractive indexes by using an iterative numerical computation method, said apparatus simultaneously measures local area-wise thickness profile and refractive index distribution among others of said a single layer or multiple layers of thin films on a substrate.

摘要翻译： 本发明涉及通过反射测量原理测量单层或多层薄膜的厚度分布和折射率分布的非接触，非破坏性测量装置。 根据本发明，通过采用多于一个窄带通滤光器和CCD传感器的二维阵列，并且通过找到用于所述薄膜或薄膜的厚度与所述薄膜之间的非线性函数关系的最佳解 通过使用迭代数值计算方法对应的折射率，所述装置同时测量衬底上所述单层或多层薄膜的局部区域厚度分布和折射率分布。