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公开(公告)号:US20240328781A1
公开(公告)日:2024-10-03
申请号:US18698644
申请日:2022-10-04
Applicant: TeraView Limited
Inventor: Ian Alasdair Pentland , Alessia Portieri , Philip Francis Taday , Bryan Edward Cole , Donald Dominic Arnone
IPC: G01B21/04 , G01B11/06 , G01B11/24 , G01N21/3581
CPC classification number: G01B21/045 , G01B11/0625 , G01B11/24 , G01N21/3581
Abstract: A method and apparatus is provided for determining the thickness of coating layers of a curved surface when examining the surface with terahertz radiation. The method involves measuring detected reflected radiation and applies a correction factor to obtain the thicknesses of the layers. This addresses the problem of compensating for the curvature of the surface when determining coating thickness.
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公开(公告)号:US12104890B2
公开(公告)日:2024-10-01
申请号:US17616298
申请日:2020-06-04
Applicant: PROCESS METRIX, LLC
Inventor: Michel P. Bonin
IPC: G01B11/06 , G01N21/954 , G01S7/481
CPC classification number: G01B11/0625 , G01N21/954 , G01S7/4817
Abstract: A scanner assembly is provided that is configured to be mounted on a scanner manipulator arm, to be placed in proximity to an opening in a vessel or inserted into an opening in a vessel, and to measure distances from a scanner emitter/sensor within the scanner assembly to a plurality of points on the surface of a refractory lining of the vessel to characterize a concave interior of the vessel in a single scan. A scanner manipulator having the manipulator arm attached to the scanner assembly maintains the scanner assembly in measurement positions. A control system controls the position of the scanner assembly, the orientation of the emitter sensor, and the acquisition, storage, processing and presentation of measurements produced by the emitter/sensor. The field of view obtained from the scanner assembly in a single scan exceeds a hemisphere.
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公开(公告)号:US12074076B2
公开(公告)日:2024-08-27
申请号:US17279810
申请日:2020-03-11
Applicant: Hitachi High-Tech Corporation
Inventor: Soichiro Eto
IPC: H01L21/66 , G01B11/06 , H01J37/22 , H01J37/244 , H01J37/32 , H01L21/3065 , H01L21/67
CPC classification number: H01L22/26 , G01B11/06 , G01B11/0625 , G01B11/0633 , G01B11/0666 , G01B11/0683 , H01J37/22 , H01J37/244 , H01J37/32082 , H01J37/32917 , H01J37/32926 , H01J37/32963 , H01J37/32972 , H01L21/3065 , H01L21/67253 , H01L22/12 , H01J2237/2445 , H01J2237/24578 , H01J2237/3343
Abstract: A plasma processing apparatus and method with an improved processing yield, the plasma processing apparatus including detector configured to detect an intensity of a first light of a plurality of wavelengths in a first wavelength range and an intensity of a second light of a plurality of wavelengths in a second wavelength range, the first light being obtained by receiving a light which is emitted into the processing chamber from a light source disposed outside the processing chamber and which is reflected by an upper surface of the wafer, and the second light being a light transmitted from the light source without passing through the processing chamber; and a determination unit configured to determine a remaining film thickness of the film layer by comparing the intensity of the first light corrected using a change rate of the intensity of the second light.
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公开(公告)号:US12055486B2
公开(公告)日:2024-08-06
申请号:US18173056
申请日:2023-02-22
Applicant: ACCESS MEDICAL SYSTEMS, LTD.
Inventor: Hong Tan
CPC classification number: G01N21/45 , G01J3/0208 , G01J3/0218 , G01J3/0224 , G01J3/024 , G01J3/45 , G01N21/7703 , G01N21/8507 , G01B11/0625 , G01J3/453 , G01N2021/458 , G01N21/55 , G01N2021/772 , G01N2201/0826 , G01N2201/0833
Abstract: The present invention is directed to an assembly for use in detecting an analyte in a sample based on thin-film spectral interference. The assembly includes a light source to emit light signals; a light detector to detect light signals; a coupler to optically couple the light source and the light detector to a waveguide tip; a monolithic substrate having a coupling side and a sensing side; and a lens between the waveguide tip and the monolithic substrate. The lens relays optical signals between the waveguide tip and the monolithic substrate.
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公开(公告)号:US20240210163A1
公开(公告)日:2024-06-27
申请号:US17913902
申请日:2021-03-24
Applicant: LAM RESEARCH CORPORATION
Inventor: Goon Heng WONG , Xuefeng HUA , Anthony Paul VAN SELOW , Daniel TORRES , Jack CHEN
CPC classification number: G01B11/0683 , C23C14/547 , C23C16/52 , G01B11/0625 , G01B11/14
Abstract: A system for determining a thickness of a substrate arranged in a processing chamber includes an emitter configured to transmit a signal toward a gap between the substrate and a component of the processing chamber arranged above the substrate, a receiver configured to receive at least a portion of the transmitted signal and generate a measurement signal based on a characteristic of the received portion of the signal, and a system controller configured to receive the measurement signal and selectively adjust a parameter of the processing chamber based on a relationship between values of the measurement signal and at least one of the thickness of the substrate, a width of the gap between the substrate and the component of the processing chamber, and an amount to adjust the parameter of the processing chamber.
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公开(公告)号:US20240159516A1
公开(公告)日:2024-05-16
申请号:US18490617
申请日:2023-10-19
Applicant: Vaxxas Pty Limited
Inventor: Michael Carl JUNGER , Christopher FLAIM
IPC: G01B11/06
CPC classification number: G01B11/0625 , G01B11/0658
Abstract: The present invention relates to devices and methods for detecting the amount (degree, extent) of material coating a medical device or substrate, in particular the present invention relates to devices and methods for detecting the amount of vaccine material coating a microarray patch.
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公开(公告)号:US11892282B2
公开(公告)日:2024-02-06
申请号:US17663490
申请日:2022-05-16
Applicant: DISCO CORPORATION
Inventor: Hiroto Yoshida , Nobuyasu Kitahara , Kuo Wei Wu , Kunimitsu Takahashi , Naoki Murazawa , Joel Koerwer
IPC: G01B11/06
CPC classification number: G01B11/0625
Abstract: A protective film thickness measuring method includes a step of applying light to a top surface of a wafer in a state in which no protective film is formed and measuring a first reflection intensity of the light reflected from the top surface, a step of forming the protective film including a light absorbing material, a step of irradiating the protective film with exciting light of a wavelength at which the light absorbing material fluoresces and measuring a second reflection intensity including fluorescence of the protective film and the light reflected from the top surface, and a step of excluding reflection intensity of patterns formed on the top surface, by subtracting the measured first reflection intensity from the measured second reflection intensity, and calculating fluorescence intensity of the protective film.
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公开(公告)号:US20230288190A1
公开(公告)日:2023-09-14
申请号:US18199868
申请日:2023-05-19
Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
Inventor: Liangjie YAN
CPC classification number: G01B11/0625 , G01S17/08 , G01S7/4813 , B05C21/00
Abstract: The present application provides a detection device and pole piece manufacturing equipment. The detection device includes: a laser ranging sensor; and a cooling module, which includes a first protective enclosure and a cooling plate, where the first protective enclosure encloses the outside of the laser ranging sensor; the first protective enclosure is provided with an avoidance portion for avoiding a laser light path of the laser ranging sensor; the first protective enclosure has a first opening; the cooling plate covers the first opening; an air flow channel is defined inside the cooling plate; surfaces of the cooling plate are provided with air inlet holes and first air outlet holes which are communicated with the air flow channel; and the first air outlet holes are disposed in a manner of facing the laser ranging sensor to blow air to the laser ranging sensor to cool the laser ranging sensor.
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公开(公告)号:US11728056B2
公开(公告)日:2023-08-15
申请号:US17779175
申请日:2019-07-01
Applicant: Hunan University , China North Nuclear Fuel Co., Ltd
Inventor: Jian Liu , Chao Jiang , Yan Xiong , Hang Zhang , Zhaochuan Hu , Rong Li , Ning Chen
CPC classification number: G21C17/06 , G01B11/0616 , G01B11/0625 , G21C3/626
Abstract: A method for detecting the thicknesses of coating layers of nuclear fuel particles, comprising: collecting a surface image of a sample to be tested under a first amplification factor (S310); determining a testable particle in the surface image (S320); collecting a cross section image of the testable particle under a second amplification factor, wherein the second amplification factor is greater than the first amplification factor (S330); and determining the center of the testable particle in the cross section image and profile lines of all coating layers, and determining the thickness of each coating layer according to the center and the profile lines of each coating layer (S340). Also provided is a device for detecting the thicknesses of coating layers of the nuclear fuel particles.
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公开(公告)号:US11713960B2
公开(公告)日:2023-08-01
申请号:US17296117
申请日:2019-11-28
Applicant: UNITY SEMICONDUCTOR
Inventor: Jean-François Boulanger , Isabelle Bergoënd
IPC: G01B9/0209 , G01B9/02 , G01B11/06
CPC classification number: G01B9/0209 , G01B9/02083 , G01B9/02088 , G01B11/0625 , G01B2210/56
Abstract: A method for measuring a surface of an object including at least one structure using low coherence optical interferometry, the method including the steps of acquiring an interferometric signal at a plurality of measurement points in a field of view and, for at least one measurement point, attributing the interferometric signal acquired to a class of interferometric signals from a plurality of classes, each of the classes being associated with a reference interferometric signal representative of a typical structure; and analysing the interferometric signal to derive therefrom an item of information on the structure at the measurement point, as a function of its class.
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