Six-transistor (6T) static random access memory (SRAM) with dynamically variable p-channel metal oxide semiconductor (PMOS) strength
    1.
    发明授权
    Six-transistor (6T) static random access memory (SRAM) with dynamically variable p-channel metal oxide semiconductor (PMOS) strength 有权
    具有动态可变p沟道金属氧化物半导体(PMOS)强度的六晶体管(6T)静态随机存取存储器(SRAM)

    公开(公告)号:US07177176B2

    公开(公告)日:2007-02-13

    申请号:US10883609

    申请日:2004-06-30

    IPC分类号: G11C11/00 G11C5/14 G11C7/10

    CPC分类号: G11C11/417 G11C11/412

    摘要: In embodiments of the present invention, a static random access memory (SRAM) device has an array of memory cells in columns and rows. An individual memory cell includes two PMOS pull-up devices coupled to two NMOS pull-down devices. In READ mode and/or STANDBY/NO-OP mode of a column, the two PMOS pull-up devices are effectively strengthened by forward biasing the PMOS n-wells or by utilizing a lower threshold voltage PMOS device by implanting a lower halo dose in the PMOS device. In WRITE mode of a column, the two PMOS pull-up devices are effectively weakened by reverse biasing the PMOS n-wells or by coupling the sources of the NMOS devices to virtual ground (VSSi).

    摘要翻译: 在本发明的实施例中,静态随机存取存储器(SRAM)装置具有列和行中的存储器单元阵列。 单个存储单元包括耦合到两个NMOS下拉器件的两个PMOS上拉器件。 在列的READ模式和/或STANDBY / NO-OP模式下,通过正向偏置PMOS n阱或利用较低阈值电压PMOS器件,通过将较低的光晕剂量 PMOS器件。 在列的写入模式下,通过反向偏置PMOS n阱或通过将NMOS器件的源耦合到虚拟接地(V SUB SSi),两个PMOS上拉器件被有效地削弱。