公开(公告)号：US07615334B2

公开(公告)日：2009-11-10

申请号：US11227089

申请日：2005-09-16

申请人： Joon Hyung Kim ,  Hyunsik Kim ,  Youngwoon Kwon ,  Jung Hyun Seo

发明人： Joon Hyung Kim ,  Hyunsik Kim ,  Youngwoon Kwon ,  Jung Hyun Seo

IPC分类号： G03C1/00 ,  G03F7/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  C09D11/30 ,  C23F1/02 ,  G03F7/0002 ,  H05K3/061 ,  H05K2203/013 ,  H05K2203/0786

摘要： Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.

摘要翻译： 提供了一种用于抗蚀剂的油墨组合物，使用该油墨组合物形成抗蚀剂图案的方法，以及使用该油墨组合物形成微通道的方法。 油墨组合物由于其在基材上的差的扩散而适于形成微图案，并且适用于印刷电路板的铜的耐蚀刻性，并且由于其优异的化学性质而使其耐蚀，因此能够抵抗印刷电路板的耐腐蚀性 蚀刻溶液。

公开(公告)号：US07199242B2

公开(公告)日：2007-04-03

申请号：US10485488

申请日：2002-08-02

申请人： Clemens Michael Helmut Brechtelsbauer ,  Stephen Thomas Carpenter ,  Trevor John Grinter ,  Michael Anthony Harris ,  Yeongdae Kim ,  Youngwoon Kwon ,  Dongchul Lee ,  François Xavier Ricard ,  Richard Neville Saunders

发明人： Clemens Michael Helmut Brechtelsbauer ,  Stephen Thomas Carpenter ,  Trevor John Grinter ,  Michael Anthony Harris ,  Yeongdae Kim ,  Youngwoon Kwon ,  Dongchul Lee ,  François Xavier Ricard ,  Richard Neville Saunders

IPC分类号： C07D471/02 ,  C07D207/46

CPC分类号： C07D471/04 ,  B01F5/0057 ,  B01F5/0615 ,  B01J19/242 ,  B01J19/32 ,  B01J2219/00166 ,  B01J2219/3221 ,  B01J2219/32213 ,  C07D207/22 ,  C07D207/36 ,  Y02P20/55

摘要： The invention provides a process for the production of a compound of formula (I): wherein P1 and P2, which may be the same or different, are amino protecting groups, which comprises protection of a compound of formula (II) in solution phase continuous operation mode. This confers advantages over batch mode operation. The process is usually conducted in reaction equipment adapted for use in continuous processing mode, for example comprising one or more static mixers or a plug flow reactor. Preferably, the plug flow reactor comprises a jacketed tubular reactor fitted inside with internal mixing elements which continually split and remix the reaction streams promoting mass and heat transfer, whereby a uniform plug flow profile with turbulent fluid flow is achieved. The invention also provides a process for production of the antibacterial compound gemifloxacin or a pharmaceutically acceptable salt and/or hydrate thereof, comprising converting a compound of formula (I). The invention also provides a process for the production of a compound of formula (VIIIa)

摘要翻译： 本发明提供了制备式（I）化合物的方法：其中可以相同或不同的P 1和P 2是氨基保护基 其包括在溶液相连续操作模式中保护式（II）的化合物。 这比批处理模式操作有优势。 该方法通常在适用于连续处理模式的反应设备中进行，例如包括一个或多个静态混合器或活塞流反应器。 优选地，活塞流反应器包括装配在其内部的内部混合元件的夹套管式反应器，其连续地分离和再混合促进质量和热传递的反应物流，从而实现具有湍流流体流动的均匀的流动流动分布。 本发明还提供了制备抗菌化合物吉米沙星或其药学上可接受的盐和/或水合物的方法，包括转化式（I）化合物。 本发明还提供了制备式（Ⅷa）化合物的方法，

公开(公告)号：US20050043546A1

公开(公告)日：2005-02-24

申请号：US10485488

申请日：2002-08-02

申请人： Clemens Brechtelsbauer ,  Stephen Carpenter ,  Trevor Grinter ,  Michael Harris ,  Yeongdae Kim ,  Youngwoon Kwon ,  Dongchul Lee ,  Francois Ricard ,  Richard Saunders

发明人： Clemens Brechtelsbauer ,  Stephen Carpenter ,  Trevor Grinter ,  Michael Harris ,  Yeongdae Kim ,  Youngwoon Kwon ,  Dongchul Lee ,  Francois Ricard ,  Richard Saunders

IPC分类号： B01F5/00 ,  B01F5/06 ,  B01J19/24 ,  B01J19/32 ,  C07D207/22 ,  C07D207/36 ,  C07D471/04 ,  C07D207/46

CPC分类号： C07D471/04 ,  B01F5/0057 ,  B01F5/0615 ,  B01J19/242 ,  B01J19/32 ,  B01J2219/00166 ,  B01J2219/3221 ,  B01J2219/32213 ,  C07D207/22 ,  C07D207/36 ,  Y02P20/55

摘要： The invention provides a process for the production of a compound of formula (I): wherein P1 and P2, which may be the same or different, are amino protecting groups, which comprises protection of a compound of formula (II) in solution phase continuous operation mode. This confers advantages over batch mode operation. The process is usually conducted in reaction equipment adapted for use in continuous processing mode, for example comprising one or more static mixers or a plug flow reactor. Preferably, the plug flow reactor comprises a jacketed tubular reactor fitted inside with internal mixing elements which continually split and remix the reaction streams promoting mass and heat transfer, whereby a uniform plug flow profile with turbulent fluid flow is achieved. The invention also provides a process for production of the antibacterial compound gemifloxacin or a pharmaceutically acceptable salt and/or hydrate thereof, comprising converting a compound of formula (I). The invention also provides a process for the production of a compound of formula (VIIIa).

摘要翻译： 本发明提供了制备式（I）化合物的方法：其中P1和P2可以相同或不同，是氨基保护基，其包括保护溶液相连续的式（II）化合物 操作模式。 这比批处理模式操作有优势。 该方法通常在适用于连续处理模式的反应设备中进行，例如包括一个或多个静态混合器或活塞流反应器。 优选地，活塞流反应器包括装配在其内部的内部混合元件的夹套管式反应器，其连续地分离和再混合促进质量和热传递的反应物流，从而实现具有湍流流体流动的均匀的流动流动分布。 本发明还提供了制备抗菌化合物吉米沙星或其药学上可接受的盐和/或水合物的方法，包括转化式（I）化合物。 本发明还提供了制备式（Ⅷa）化合物的方法。

公开(公告)号：US20060060563A1

公开(公告)日：2006-03-23

申请号：US11227089

申请日：2005-09-16

申请人： Joon Kim ,  Hyunsik Kim ,  Youngwoon Kwon ,  Jung Hyun Seo

发明人： Joon Kim ,  Hyunsik Kim ,  Youngwoon Kwon ,  Jung Hyun Seo

IPC分类号： C23F1/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  C09D11/30 ,  C23F1/02 ,  G03F7/0002 ,  H05K3/061 ,  H05K2203/013 ,  H05K2203/0786

摘要： Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.