Position measurement apparatus and method and pattern forming apparatus and writing method
    1.
    发明授权
    Position measurement apparatus and method and pattern forming apparatus and writing method 有权
    位置测量装置和方法以及图案形成装置和书写方法

    公开(公告)号:US07640142B2

    公开(公告)日:2009-12-29

    申请号:US11492843

    申请日:2006-07-26

    IPC分类号: H04B15/00

    摘要: A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value outputted by the measurement unit, a second filter connected in parallel with the first filter configured to attenuate a second component other than the certain frequency region of the measured value outputted by the measurement unit, a third filter connected in series to the second filter with the series connection of the second and third filters connected in parallel with the first filter, configured to attenuate the first component of the certain frequency region of the measured value outputted by the measurement unit, and a processing unit configured to combine an output of the first filter and an output of the series connection of the second and third filters and to thereby output a first combined value.

    摘要翻译: 位置测量装置包括可移动平台结构,使用激光测量台的移动位置并输出相应测量值的测量单元,被配置为衰减测量值的某个频率区域的第一分量的第一滤波器 由所述测量单元输出的与所述第一滤波器并联连接的第二滤波器,被配置为衰减由所述测量单元输出的测量值的所述特定频率区域以外的第二分量;第三滤波器,其与所述第二滤波器串联连接, 与第一滤波器并联连接的第二和第三滤波器的串联连接,被配置为衰减由测量单元输出的测量值的特定频率区域的第一分量;以及处理单元,被配置为组合第一滤波器的输出 以及第二和第三滤波器的串联连接的输出,从而输出第一滤波器 综合价值。

    SUBSTRATE COVER, AND CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
    2.
    发明申请
    SUBSTRATE COVER, AND CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD 有权
    基板盖和充电颗粒光束写字装置和方法

    公开(公告)号:US20080054195A1

    公开(公告)日:2008-03-06

    申请号:US11838465

    申请日:2007-08-14

    申请人: Yuichi TACHIKAWA

    发明人: Yuichi TACHIKAWA

    IPC分类号: G21K5/04 G21F3/00

    摘要: A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, and a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.

    摘要翻译: 衬底盖包括框架状构件,其被配置为放置在要使用带电粒子束书写的衬底上,并且具有大于衬底的周边端部的外周尺寸和内周尺寸,其为 框架状构件和内部开口部分之间的边界,小于基板的周边端部,以及构造成设置在框架构件的下表面上的接触点部件,以便电连接到基板 。

    Substrate cover, and charged particle beam writing apparatus and method
    3.
    发明授权
    Substrate cover, and charged particle beam writing apparatus and method 有权
    基板盖和带电粒子束写入装置及方法

    公开(公告)号:US07608528B2

    公开(公告)日:2009-10-27

    申请号:US11838465

    申请日:2007-08-14

    申请人: Yuichi Tachikawa

    发明人: Yuichi Tachikawa

    IPC分类号: H01L21/62 G21K5/04

    摘要: A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, and a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.

    摘要翻译: 衬底盖包括框架状构件,其被配置为放置在要使用带电粒子束书写的衬底上,并且具有大于衬底的周边端部的外周尺寸和内周尺寸,其为 框架状构件和内部开口部分之间的边界,小于基板的周边端部,以及构造成设置在框架构件的下表面上的接触点部件,以便电连接到基板 。

    Position measurement apparatus and method and pattern forming apparatus and writing method
    4.
    发明申请
    Position measurement apparatus and method and pattern forming apparatus and writing method 有权
    位置测量装置和方法以及图案形成装置和书写方法

    公开(公告)号:US20070024864A1

    公开(公告)日:2007-02-01

    申请号:US11492843

    申请日:2006-07-26

    IPC分类号: G01B11/02

    摘要: A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value outputted by said measurement unit, a second filter connected in parallel with said first filter configured to attenuate a second component other than the certain frequency region of the measured value outputted by said measurement unit, a third filter connected in series to said second filter with the series connection of said second and third filters connected in parallel with the first filter, configured to attenuate the first component of said certain frequency region of the measured value outputted by said measurement unit, and a synthetic unit configured to combine an output of said first filter and an output of the series connection of the second and third filters and to thereby output a first combined value.

    摘要翻译: 位置测量装置包括可移动平台结构,使用激光测量台的移动位置并输出相应测量值的测量单元,被配置为衰减测量值的某个频率区域的第一分量的第一滤波器 由所述测量单元输出的与所述第一滤波器并联连接的第二滤波器被配置为衰减由所述测量单元输出的测量值的特定频率区域以外的第二分量;第三滤波器,其与所述第二滤波器串联连接, 与所述第一滤波器并联连接的所述第二和第三滤波器的串联连接,被配置为衰减由所述测量单元输出的测量值的所述特定频率区域的第一分量;以及合成单元,被配置为将所述第一滤波器的输出 以及第二和第三滤波器的串联连接的输出,从而输出 第一个合并价值。