公开(公告)号：US6064148A

公开(公告)日：2000-05-16

申请号：US859692

申请日：1997-05-21

申请人： Zhidam Li Tolt ,  Zvi Yaniv ,  Richard Lee Fink

发明人： Zhidam Li Tolt ,  Zvi Yaniv ,  Richard Lee Fink

IPC分类号： H01J1/304 ,  H01J9/02 ,  H01J19/24

CPC分类号： H01J9/025 ,  H01J2201/30457 ,  H01J2329/00

摘要： A film (carbon and/or diamond) for a field emitter device, which may be utilized within a computer display, is produced by a process utilizing etching of a substrate and then depositing the film. The etching step creates nucleation sites on the substrate for the film deposition process. With this process patterning of the emitting film is avoided. A field emitter device can be manufactured with such a film. A field emission device results where the cathode has a continuous film that has not been subjected to etching, and thus has superior emission properties. A pixel in the cathode includes the emitting film deposited directly on the substrate with the conductor deposited on one or more sides of the emitter film. In one embodiment the emitter is in a window formed in the conductor layer.

摘要翻译： 可以在计算机显示器内使用的用于场致发射器件的膜（碳和/或金刚石）通过利用蚀刻基底然后沉积膜的方法产生。 蚀刻步骤在用于薄膜沉积工艺的基底上产生成核位点。 通过该过程避免了发光膜的图案化。 可以制造具有这种膜的场发射器装置。 导致场致发射器件，其中阴极具有未经受蚀刻的连续膜，因此具有优异的发射性能。 阴极中的像素包括直接沉积在衬底上的发射膜，其中导体沉积在发射极膜的一个或多个侧面上。 在一个实施例中，发射器在形成在导体层中的窗口中。