Abstract:
High frequency power diode including a semiconductor wafer having first and second main sides, a first layer of a first conductivity type formed on the first main side, a second layer of a second conductivity type formed on the second main side and a third layer of the second conductivity type formed between the first layer and the second layer. The first layer has a dopant concentration decreasing from 1019 cm−3 or more adjacent to the first main side of the wafer to 1.5.1015 cm−3 or less at an interface of the first layer with the third layer. The second layer has a dopant concentration decreasing from 1019 cm−3 or more adjacent to the second main side of the wafer to 1.5.1015 cm−3 at an interface of the second layer with the third layer and the third layer has a dopant concentration of 1.5.1015 cm−3 or less.
Abstract translation:高频功率二极管包括具有第一和第二主侧面的半导体晶片,形成在第一主侧的第一导电类型的第一层,形成在第二主侧的第二导电类型的第二层和第二层 形成在第一层和第二层之间的第二导电类型。 第一层在第一层与第三层的界面处具有从晶片的第一主侧相邻的1019cm-3或更大的掺杂剂浓度降低至1.5.1015cm-3或更小的掺杂浓度。 第二层在第二层与第三层的界面处具有从晶片的第二主侧相邻的1019cm-3或更大的掺杂剂浓度降低至1.5.1015cm-3,并且第三层具有掺杂剂浓度 为1.5×10 15 cm -3以下。
Abstract:
A power semiconductor device is disclosed having a power semiconductor element with an upper and lower side, the upper side being located opposite to the lower side; a first and second electrode, and a housing, wherein the power semiconductor element is arranged between the first and second electrode such, that the upper side comprises a first contact portion being in contact with the first electrode and a first free portion not being in contact with the first electrode, and wherein the lower side at least comprises a second contact portion being in contact with the second electrode, and wherein a channel is provided fluidly connecting at least a part of the first free portion with a predetermined degassing point of the housing for guiding an overpressure, which overpressure results from plasma and/or gas occurring in a failure mode, from the first free portion to the predetermined degassing point.