公开(公告)号：US20200058473A1

公开(公告)日：2020-02-20

申请号：US16610391

申请日：2018-04-27

Applicant: AGC GLASS EUROPE ,  AGC Inc. ,  AGC GLASS COMPANY NORTH AMERICA ,  AGC VIDROS DO BRASIL LTDA

Inventor： Hugues WIAME ,  John CHAMBERS ,  Marc DATZ

IPC: H01J37/32 ,  C23C16/503

Abstract: The present invention relates to an electrode pair for generating a linear plasma wherein the electrodes (21, 22) are segmented. More particularly, the present invention relates to a plasma source, for instance a hollow-cathode plasma source, comprising one or more plasma-generating electrode pairs wherein the electrodes are segmented. The present invention further relates to methods for controlling the uniformity of a linear plasma and also to methods for surface treating or coating substrates in a uniform way with linear plasma sources.

公开(公告)号：US20170226631A1

公开(公告)日：2017-08-10

申请号：US15518968

申请日：2015-10-20

Applicant: AGC GLASS EUROPE

Inventor： Oliver KAPPERTZ ,  Lars MICHEL ,  Marc DATZ

IPC: C23C14/58 ,  C03C17/36

CPC classification number: C23C14/5813 ,  C03C17/36 ,  C03C17/3613 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3642 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/216 ,  C03C2217/256 ,  C03C2217/27 ,  C03C2217/281 ,  C03C2218/156 ,  C03C2218/32

Abstract: The invention relates to a technique of manufacturing a coated substrate (102) such as glass (104) carrying a conductive layer (112) such as a metal layer to be tempered after deposition. A system (100) for manufacturing the coated substrate (102) may comprise a sputtering configuration (120) adapted for depositing the conductive layer (112) on the substrate (104). A pulse laser (132) is adapted for irradiating the conductive layer (112) with laser pulses (136). The pulse laser (132) is adapted for laser pulses (136) with a pulse duration below one microsecond.