公开(公告)号：US20220411322A1

公开(公告)日：2022-12-29

申请号：US17895149

申请日：2022-08-25

Applicant: AGC Inc.

Inventor： Kazuya SASAKI

IPC: C03C11/00 ,  C03C3/06 ,  C03B20/00 ,  C03B19/08

Abstract: The present invention relates to a silica glass including bublles in the number of 1×107/cm3 to 1×1015/cm3 and having a density of 0.5 g/cm3 to 1.95 g/cm3. The present invention also relates to a method for producing a silica glass, including: a step of depositing SiO2 fine particles generated by flame hydrolysis of a silicon compound, to obtain a silica glass porous body; a step of heating and sintering the silica glass porous body in an inert gas atmosphere, to obtain a silica glass dense body; and a step of performing a foaming treatment to heat the silica glass dense body under a reduced pressure condition.

公开(公告)号：US20240208854A1

公开(公告)日：2024-06-27

申请号：US18424963

申请日：2024-01-29

Applicant: AGC Inc.

Inventor： Tomoki OWADA ,  Kazuya SASAKI ,  Masahiro KAWAGISHI ,  Satoru KURATA

IPC: C03C3/078 ,  C03C3/06

CPC classification number: C03C3/078 ,  C03C3/06 ,  C03C2204/00

Abstract: The present invention relates to a TiO2-containing silica glass substrate that: contains 6.7-12 mass % of TiO2, expressed as a mass percentage on an oxide basis; has a CTE-slope of 1.40 ppb/K/K or less; and, in at least one main surface and at least one end surface, (A) no striae are observed in a stria evaluation in compliance with JOGIS 11-2008, or (B) the striation intensity corresponds to class A under US military specification MTL-G-174 B.

公开(公告)号：US20200255324A1

公开(公告)日：2020-08-13

申请号：US16860107

申请日：2020-04-28

Applicant: AGC Inc.

Inventor： Nobutaka KIDERA ,  Kazuya SASAKI ,  Yasutomi IWAHASHI

IPC: C03C3/06 ,  C03C4/16 ,  H01P1/208 ,  H01P3/12

Abstract: A silica glass for a radio-frequency device has an OH group concentration being less than or equal to 300 wtppm; an FQ value being higher than or equal to 90,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz.

公开(公告)号：US20240025802A1

公开(公告)日：2024-01-25

申请号：US18479859

申请日：2023-10-03

Applicant: AGC Inc.

Inventor： Kazuya SASAKI

IPC: C03C11/00 ,  C03B19/14

CPC classification number: C03C11/00 ,  C03B19/1453

Abstract: An object of the present invention is to provide a technique capable of obtaining a shower plate having cleaning resistance without machining. The present invention relates to a silica glass porous body having a plurality of pores, in which the plurality of pores includes a non-communication pore and a communication pore, and the pores have an average pore size, obtained by mercury intrusion porosimetry, of 10 μm to 150 μm.

公开(公告)号：US20240025795A1

公开(公告)日：2024-01-25

申请号：US18479852

申请日：2023-10-03

Applicant: AGC Inc.

Inventor： Kazuya SASAKI

IPC: C03C3/06 ,  C03B32/00

CPC classification number: C03C3/06 ,  C03B32/00

Abstract: The present invention relates to a silica glass member having a plurality of pores, in which some or all of the plurality of pores are communication pores, and S/S0 is 1.5 or more. S: surface area obtained by a BET method for a 40 mm×8 mm×0.5 mm sample cut from the silica glass member; and S0: geometric surface area obtained based on external dimensions of the sample.