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公开(公告)号:US20220037605A1
公开(公告)日:2022-02-03
申请号:US17451675
申请日:2021-10-21
Applicant: AGC Inc.
Inventor: Satoru WATANABE , Yoshitake TODA , Kunio MASUMO , Nao ISHIBASHI , Nobuhiro NAKAMURA , Shimpei MORITA , Hikaru KOBAYASHI
Abstract: An assembly of nanoparticles includes metal oxide, the nanoparticles including zinc (Zn) and silicon (Si). In addition, the nanoparticles have an atomic ratio of Zn/(Zn+Si) in a range of 0.3 to 0.95. Further, the nanoparticles have an equivalent circular particle diameter in a range of 1 nm to 20 nm.
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公开(公告)号:US20200287051A1
公开(公告)日:2020-09-10
申请号:US16878904
申请日:2020-05-20
Applicant: AGC Inc.
Inventor: Kunio MASUMO , Nao ISHIBASHI , Nobuhiro NAKAMURA , Satoru WATANABE , Kazuto OHKOSHI , Naomichi MIYAKAWA
IPC: H01L29/786 , H01L29/24 , H01L29/45 , H01L21/02 , H01L21/383 , H01L21/425 , H01L29/66
Abstract: A thin film transistor of a top-gate-coplanar type includes a source, a drain, a gate, and a semiconductor layer, wherein the semiconductor layer has a first low-resistance region for the source and a second low-resistance region for the drain, wherein the source and the drain are electrically connected through the first low-resistance region, the semiconductor layer, and the second low-resistance region, and wherein the semiconductor layer is formed of an oxide-based semiconductor containing gallium (Ga), zinc (Zn), and tin (Sn).
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