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公开(公告)号:US10607749B2
公开(公告)日:2020-03-31
申请号:US15803902
申请日:2017-11-06
Applicant: AGC Inc.
Inventor: Shigeru Aida , Yoji Nakajima , Toshifumi Kakiuchi , Masakazu Ataku
IPC: C08F14/26 , H01B3/44 , C08F214/26 , C08F210/02 , C09D127/18 , C08F2/06 , C08F4/34
Abstract: To provide an ETFE copolymer and a wire coating resin material capable of forming a coating layer which is excellent in stress cracking resistance under a high temperature and which has a high heat resistance temperature, and an electric wire having a coating layer which is excellent in stress cracking resistance under a high temperature and which has a high heat resistance temperature. A copolymer comprising structural units derived from ethylene, structural units derived from tetrafluoroethylene, and structural units derived from a third monomer, wherein in an elution curve obtained by a temperature rising elution fractionation method with respect to the copolymer, a ratio (L/H) of a proportion (L: area %) of components with elution temperatures of from 190 to 200° C. to a proportion (H: area %) of components with elution temperatures of at least 205° C., and a proportion (M: mol %) of structural units derived from the third monomer based on all structural units of the copolymer, satisfy a relation of log (L/H)/M≥0.90.
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公开(公告)号:US10332734B2
公开(公告)日:2019-06-25
申请号:US15799263
申请日:2017-10-31
Applicant: AGC Inc.
Inventor: Yuko Tachibana , Yoji Nakajima
Abstract: Provided is a sample plate for mass spectrometric analysis, which comprises a substrate and a metal thin film formed on the substrate. The metal thin film contains Ag, Al or Cu as the main component and further contains a specific additive element MAg, MAl or MCu depending on the element as the main component, in a ratio (MAg/Ag) of the total number of atoms of the additive element MAg to the number of atoms of Ag of from 0.001 to 0.5, a ratio (MAl/Al) of the total number of atoms of the additive element MAl to the number of atoms of Al of from 0.001 to 0.5, or a ratio (MCu/Cu) of the total number of atoms of the additive element MCu to the number of atoms of Cu of from 0.001 to 0.5.
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