CVD OR PVD REACTOR FOR COATING LARGE-AREA SUBSTRATES

    公开(公告)号:US20170314134A1

    公开(公告)日:2017-11-02

    申请号:US15528476

    申请日:2015-11-18

    Applicant: AIXTRON SE

    Abstract: A CVD or PVD coating device comprises a housing and a gas inlet organ secured to the housing via a retaining device, the gas inlet organ having a gas outlet surface with gas outlet openings. The retaining device is only secured at its horizontal edge to the housing so as to stabilize the retaining device with respect to deformations and temperature. The gas inlet organ is secured, at a plurality of suspension points, to the retaining device by means of a plurality of hanging elements distributed over the entire horizontal surface of the retaining device. The retaining device has mechanical stabilization elements formed by a retaining frame having vertical walls that are interconnected at vertical connection lines. An actively cooled heat shield is situated between the retaining device and the gas inlet organ.

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