METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT
    1.
    发明申请
    METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT 有权
    检查缺陷的方法和检查缺陷的装置

    公开(公告)号:US20070247616A1

    公开(公告)日:2007-10-25

    申请号:US11770217

    申请日:2007-06-28

    IPC分类号: G01N21/01 G01N21/00

    摘要: The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译: 本发明是用于检查异物的缺陷的装置,包括照明光学系统,检测光学系统,屏蔽单元,其设置在所述检测光学系统中,以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统,其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶,或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜,或通过加热,突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。