公开(公告)号：US20080011601A1

公开(公告)日：2008-01-17

申请号：US11771366

申请日：2007-06-29

申请人： ALLEN KA-LING LAU ,  Makoto Inagawa ,  Bradley O. Stimson ,  Akihiro Hosokawa

发明人： ALLEN KA-LING LAU ,  Makoto Inagawa ,  Bradley O. Stimson ,  Akihiro Hosokawa

IPC分类号： C23C14/35

CPC分类号： C23C14/35 ,  H01J37/32724 ,  H01J37/34 ,  H01J37/3438 ,  H01J37/3455

摘要： A physical vapor deposition (PVD) apparatus and a PVD method are disclosed. Extending an anode across the processing space between the target and the substrate may increase deposition uniformity on a substrate. The anode provides a path to ground for electrons that are excited in the plasma and may uniformly distribute the electrons within the plasma across the processing space rather than collect at the chamber walls. The uniform distribution of the electrons within the plasma may create a uniform deposition of material on the substrate. The anodes may be cooled with a cooling fluid to control the temperature of the anodes and reduce flaking. The anodes may be disposed across the process space perpendicular to the long side of a magnetron that may scan in two dimensions across the back of the sputtering target. The scanning magnetron may reduce localized heating of the anode.

摘要翻译： 公开了物理气相沉积（PVD）装置和PVD方法。 将阳极延伸穿过靶和衬底之间的处理空间可增加衬底上的沉积均匀性。 阳极为在等离子体中被激发的电子提供到地面的路径，并且可以将等离子体内的电子均匀地分布在处理空间中，而不是在室壁处收集。 电子在等离子体内的均匀分布可能会在衬底上产生均匀的材料沉积。 阳极可以用冷却流体冷却以控制阳极的温度并减少剥落。 阳极可以跨过垂直于磁控管的长边的处理空间，其可以跨过溅射靶的背面的二维扫描。 扫描磁控管可以减少阳极的局部加热。