Heater block and heat treatment apparatus having the same
    1.
    发明授权
    Heater block and heat treatment apparatus having the same 有权
    加热器组件和热处理设备具有相同的功能

    公开(公告)号:US09117858B2

    公开(公告)日:2015-08-25

    申请号:US13791848

    申请日:2013-03-08

    CPC classification number: H01L21/67115

    Abstract: A heater block according to the present invention comprises a light-emitting lamp; a concave reflecting member that is placed opposite the lamp and has a concave reflecting surface at one surface faced with the lamp; a lens module that is inserted into the concave reflecting member and has at least one lens; and a flat reflecting member that is placed opposite the lens module. According to embodiments of the present invention, light emitted from the lamp is reflected by the concave reflecting member. Then, light and heat are collected from the reflected light by the flat reflecting member and the lens module and are irradiated on a substrate. That is, light having energy greater than a conventional manner is irradiated on the substrate to enhance the instant heating temperature and temperature increasing rate of substrate and to increase a heat-focusing area. Therefore, it has an advantage that the productivity of semiconductor or display device manufacture that requires a rapid thermal process is improved.

    Abstract translation: 根据本发明的加热器块包括发光灯; 与所述灯相对放置的凹面反射构件,在与所述灯对置的一个面上具有凹面反射面; 透镜模块,其插入到所述凹面反射构件中并且具有至少一个透镜; 以及与透镜模块相对放置的平坦的反射部件。 根据本发明的实施例,从灯发射的光被凹面反射部件反射。 然后,通过平面反射部件和透镜组件从反射光收集光和热,并将其照射在基板上。 也就是说,具有大于常规方式的能量的光被照射在基板上以增强基板的即时加热温度和温度升高速率并增加热聚焦区域。 因此,具有提高需要快速热处理的半导体或显示装置制造的生产率的优点。

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