公开(公告)号：US10384299B2

公开(公告)日：2019-08-20

申请号：US13928264

申请日：2013-06-26

Applicant: Apple Inc.

Inventor： Simon R. Lancaster-Larocque ,  Collin Chan ,  Kensuke Uemura ,  Purwadi Raharjo

IPC: B23K15/00 ,  B23K15/02 ,  B23K20/12 ,  H01J37/05 ,  H01J37/305

Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.

公开(公告)号：US20150001192A1

公开(公告)日：2015-01-01

申请号：US13928264

申请日：2013-06-26

Applicant: Apple Inc.

Inventor： Simon R. Lancaster-Larocque ,  Collin Chan ,  Kensuke Uemura ,  Purwadi Raharjo

IPC: H01J37/317 ,  B23K15/00

CPC classification number: B23K15/00 ,  B23K15/02 ,  B23K20/122 ,  H01J37/05 ,  H01J37/305 ,  H01J2237/05

Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.

Abstract translation: 所描述的实施例一般涉及调整电子束的输出或调节。 更具体地，公开了涉及将入射到工件的电子束的覆盖区保持在限定的能级内的各种构造。 这种构造允许电子束仅将工件的特定部分加热到金属间化合物溶解的过热状态。 在一个实施例中，公开了防止电子束的低能量部分接触工件的掩模。 在另一个实施例中，电子束可以以将电子束维持在能量水平使得基本上所有的电子束都高于阈值能级的方式聚焦。

公开(公告)号：US20130248374A1

公开(公告)日：2013-09-26

申请号：US13626882

申请日：2012-09-26

Applicant: APPLE INC.

Inventor： Simon R. Lancaster- Larocque ,  Purwadi Raharjo ,  Kensuke Uemura

IPC: C25F3/20 ,  C25D11/08 ,  C25F7/00

CPC classification number: B23K15/0013 ,  B44C1/227 ,  C25F3/20

Abstract: A highly polished surface on an aluminum substrate is formed using any number of machining processes. During the machining process, intermetallic compounds are typically generated at a top surface area of the aluminum substrate caused by spot heat generated between the tool edge and the cut tip of the aluminum substrate during the cutting process. The intermetallic compounds can leave surface imperfections after conventional mechanical polishing operations that render the surface of the aluminum substrate difficult to obtain a desired high glossiness due to exfoliation of the intermetallic compounds from the top surface. In order to remove the effect of the intermetallic compounds, an acid etching solution is applied to the surface resulting in removal of intermetallic compounds across a surface portion of the aluminum substrate.

Abstract translation: 使用任何数量的加工工艺形成铝基板上高度抛光的表面。 在加工过程中，金属间化合物通常在铝基板的顶表面区域产生，这是由于在切割过程中工具边缘与铝基板的切割尖端之间产生的点热引起的。 金属间化合物可以在常规机械抛光操作之后留下表面缺陷，使得铝基材的表面由于顶表面的金属间化合物的剥落而难以获得期望的高光泽度。 为了去除金属间化合物的作用，将酸蚀刻溶液施加到表面，导致穿过铝基板的表面部分去除金属间化合物。