公开(公告)号：US20210035851A1

公开(公告)日：2021-02-04

申请号：US16526840

申请日：2019-07-30

Applicant: APPLIED MATERIALS, INC.

Inventor： CHANGHUN LEE ,  MICHAEL D. WILLWERTH ,  JEFFREY LUDWIG

IPC: H01L21/687 ,  H01L21/67

Abstract: Embodiments of a substrate support for use in a processing chamber are provided herein. In some embodiments, a substrate support includes a pedestal having an upper surface configured to accommodate a lift pin, a first annular region near an edge of the pedestal, and a second annular region disposed between the first annular region and a center of the pedestal, wherein the pedestal includes a first plurality of holes extending from the upper surface at regular intervals along the first annular region and a second plurality of holes extending from the upper surface at regular intervals along the second annular region; and a non-metal ball comprising aluminum oxide disposed in each hole of the first plurality of holes and the second plurality of holes, wherein an upper surface of each of the non-metal balls is raised with respect to the upper surface of the pedestal to define a support surface.