公开(公告)号：US20190326114A1

公开(公告)日：2019-10-24

申请号：US16381755

申请日：2019-04-11

Applicant: APPLIED MATERIALS, INC.

Inventor： JESSICA S. KACHIAN ,  JUKKA TANSKANEN ,  WENYU ZHANG ,  MICHAEL S. JACKSON ,  CHANG KE ,  LIQI WU

IPC: H01L21/02 ,  C23C16/458

Abstract: Methods for treating a substrate including: contacting a substrate having a top surface with a first self-assembled monolayer (SAM) precursor or a first small-molecule monolayer (SMM) precursor, a co-reactant, and a second SAM precursor or a second SMM precursor to form a first layer on the top surface. Selective deposition methods are also disclosed.