公开(公告)号：US20030048427A1

公开(公告)日：2003-03-13

申请号：US10055869

申请日：2002-01-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Andres Fernandez ,  Marian Mankos ,  Jeffrey S. Sullivan ,  Paul C. Allen

IPC: G03B027/42

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J37/073 ,  H01J37/3175 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.

Abstract translation: 电子束光刻系统具有包括至少一个激光器的电子枪，该激光器可在第一模式中操作以产生用于光刻的电子。 电子束光刻系统可在第二模式中操作，以通过施加激光来再生电子枪的光电阴极。 光电阴极包括碲化铯层。