公开(公告)号：US11862430B2

公开(公告)日：2024-01-02

申请号：US17392571

申请日：2021-08-03

申请人： KIOXIA CORPORATION

发明人： Ryota Seki

IPC分类号： G03F7/00 ,  B29C33/38 ,  H01J37/317

CPC分类号： H01J37/3175 ,  B29C33/3842 ,  G03F7/0002 ,  H01J2237/31777

摘要： According to one embodiment, a pattern formation method includes placing an imprint resist film on a substrate, then imprinting a pattern in the imprint resist film. The pattern has a first loop section in a first end portion and a second loop section in a second end portion. After the imprint resist film has been patterned, it is selectively irradiated between the first loop section and the second loop section. The imprint resist film is then etched under conditions leaving the selectively irradiated portion of the imprint resist film and removing the unirradiated portion of the imprint resist film.

公开(公告)号：US20230154719A1

公开(公告)日：2023-05-18

申请号：US18155684

申请日：2023-01-17

申请人： ASML Netherlands B.V.

发明人： Laura DINU-GURTLER ,  Eric Petrus HOGERVORST ,  Jurgen VAN SOEST

IPC分类号： H01J37/04 ,  G03F7/20 ,  H01J37/10 ,  H01J37/244 ,  H01J37/317 ,  H01L21/263

CPC分类号： H01J37/04 ,  G03F7/70016 ,  H01J37/10 ,  H01J37/244 ,  H01J37/3175 ,  H01L21/263 ,  H01J2237/061

摘要： The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

公开(公告)号：US20170169994A1

公开(公告)日：2017-06-15

申请号：US15342296

申请日：2016-11-03

申请人： NuFlare Technology, Inc.

发明人： Kenichi Yasui ,  Shigehiro Hara ,  Shinji Sakamoto

IPC分类号： H01J37/302 ,  H01J37/317

CPC分类号： H01J37/3026 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31776

摘要： In one embodiment, a data processing method is for creating write data from design data, and registering the write data into a writing apparatus. The method includes applying, to a plurality of pieces of first frame data into which first chip data of the design data is divided, a plurality of conversion processes to create the write data, and applying a plurality of pre-processes to a plurality of pieces of second frame data into which second chip data of the write data is divided, and registering the second chip data into the writing apparatus. The plurality of conversion processes and the plurality of pre-processes are each performed in a pipeline processing on a per-frame basis. The write data is registered into the writing apparatus on a per-chip basis, on a per-virtual chip basis, or on a per-frame basis. The virtual chip includes a plurality of chips combined together.

公开(公告)号：US09536706B2

公开(公告)日：2017-01-03

申请号：US15048004

申请日：2016-02-19

申请人： CORPORATION FOR NATIONAL RESEARCH INITIATIVES

发明人： Michael A. Huff ,  Michael Pedersen

IPC分类号： A61N5/00 ,  G03B27/32 ,  G03B27/54 ,  H01J37/317 ,  G03F7/20 ,  H01L21/027 ,  H01L21/67

CPC分类号： H01J37/3175 ,  G03F7/2059 ,  G03F7/70383 ,  H01J37/3177 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31789 ,  H01L21/0277 ,  H01L21/67005

摘要： A dynamic pattern generator (DPG) device and method of making a DPG device are disclosed. The DPG device is used in semiconductor processing tools that require multiple electron-beams, such as direct-write lithography. The device is a self-aligned DPG device that enormously reduces the required tolerances for aligning the various electrode layers, as compared to other design configurations including the non-self-aligned approach and also greatly simplifies the process complexity and cost. A process sequence for both integrated and non-integrated versions of the self-aligned DPG device is described. Additionally, an advanced self-aligned DPG device that eliminates the need for a charge dissipating coating or layer to be used on the device is described. Finally, a fabrication process for the implementation of both integrated and non-integrated versions of the advanced self-aligned DPG device is described.

摘要翻译： 公开了一种动态图案发生器（DPG）装置和制造DPG装置的方法。 DPG器件用于需要多个电子束的半导体处理工具，例如直写光刻。 与其他设计配置（包括非自对准方法）相比，该器件是一种自对准DPG器件，极大地减少了对准各种电极层所需的公差，并大大简化了工艺的复杂性和成本。 描述了自对准DPG设备的集成和非集成版本的处理顺序。 另外，描述了一种先进的自对准DPG器件，其不需要在器件上使用的电荷消散涂层或层。 最后，描述了用于实现高级自对准DPG设备的集成和非集成版本的制造过程。

公开(公告)号：US09355751B2

公开(公告)日：2016-05-31

申请号：US14541238

申请日：2014-11-14

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/24 ,  H01J37/30 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

摘要： The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

摘要翻译： 本发明涉及一种电极堆叠（70），其包括用于沿光轴（A）操纵带电粒子束的堆叠电极（71-80）。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开，并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构（89），用于将电极（71-80）沿着轴向方向（Z）定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分（86）的电极主体，其中每个支撑部分构造成容纳至少一个间隔结构（89）。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分（86）以及中间间隔结构（89）保持在一起的夹紧构件（91-91c）。

公开(公告)号：US20160012170A1

公开(公告)日：2016-01-14

申请号：US14795547

申请日：2015-07-09

申请人： IMS Nanofabrication AG

发明人： Elmar Platzgummer

IPC分类号： G06F17/50 ,  H01J37/09 ,  H01J37/317

CPC分类号： H01J37/3177 ,  G06F17/5072 ,  G06F17/5081 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/3175 ,  H01J2237/31764

摘要： An exposure pattern is computed which is used for exposing a desired pattern on a target in a charged-particle multi-beam processing apparatus so as to match a reference writing tool, possible of different type: The desired pattern is provided as a graphical representation suitable for the reference tool, such as a raster graphics, on the image area on the target. A convolution kernel is used which describes a mapping from an element of the graphical representation to a group of pixels which is centered around a nominal position of said element. A nominal exposure pattern is calculated by convolution of the graphical representation with the convolution kernel, said nominal exposure pattern being suitable to create a nominal dose distribution on the target when exposed with the processing apparatus.

摘要翻译： 计算曝光图案，其用于在带电粒子多光束处理装置中的目标上曝光期望图案，以便匹配可能具有不同类型的参考写入工具：期望的图案被提供为适当的图形表示 用于参考工具，如光栅图形，在目标上的图像区域上。 使用卷积核，其描述从图形表示的元素到以所述元素的标称位置为中心的一组像素的映射。 通过图形表示与卷积核的卷积来计算标称曝光图案，所述标称曝光图案适于在用处理装置曝光时在目标上产生标称剂量分布。

公开(公告)号：US20150303027A1

公开(公告)日：2015-10-22

申请号：US14624881

申请日：2015-02-18

申请人： JEOL Ltd.

发明人： Noriyuki Kobayashi ,  Yoshiaki Takizawa

IPC分类号： H01J37/20 ,  H01J37/317

CPC分类号： H01J37/20 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0044 ,  H01J2237/2007

摘要： A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

摘要翻译： 带电粒子束光刻系统（100）通过将带电粒子束（L）引导到衬底上来描绘衬底（2）上的图案。 系统（100）包括其上设置有基板（2）的基板台（10）和基板盖（20）。 盖（20）具有在平面内观察时覆盖基板（2）的外周部的框架部（22）。 框架部分（22）具有设置在平台（10）上的第一部分（22a）和能够通过运输部分（40）装载和卸载在台架（10）上的第二部分（22b）。 当第二部分（22b）装载在平台（10）上时，它被电接地。

公开(公告)号：US09164372B2

公开(公告)日：2015-10-20

申请号：US14578060

申请日：2014-12-19

申请人： D2S, Inc.

发明人： Akira Fujimura ,  Ingo Bork ,  Etienne Jacques

IPC分类号： G03F1/20 ,  G03F1/36 ,  G03F1/78 ,  H01J37/317 ,  G03F1/00

CPC分类号： G03F1/36 ,  G03F1/144 ,  G03F1/20 ,  G03F1/78 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/30461

摘要： A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR.

摘要翻译： 公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中确定了一系列带电粒子束射击，其中一系列射击能够在表面上形成连续的非曼哈顿轨道，使得 非曼哈顿轨道具有几乎等于目标LWR的线宽粗糙度（LWR）。 还公开了用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中确定至少两个系列的镜头，其中每个镜头系列能够在表面上形成连续的非曼哈顿轨道，并且其中 轨道之间的间距具有几乎等于目标SWR的空间宽度粗糙度（SWR）。

公开(公告)号：US20150179403A1

公开(公告)日：2015-06-25

申请号：US14639786

申请日：2015-03-05

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Yu-Chi Chen

IPC分类号： H01J37/317 ,  H01J37/30 ,  H01J37/147

CPC分类号： H01J37/3174 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/15 ,  H01J2237/30472 ,  H01J2237/3175 ,  H01J2237/31762 ,  H01J2237/31774 ,  H01J2237/31789

摘要： A method of manufacturing a substrate is disclosed. The method includes receiving a plurality of pixel elements, wherein each of the pixel elements includes data members; and transferring the data members to a plurality of exposing devices that are configured to conditionally expose the substrate with an incident energy beam when coupled with the data members, wherein different data members of one pixel element are transferred at different system cycles.

摘要翻译： 公开了一种制造衬底的方法。 该方法包括接收多个像素元素，其中每个像素元素包括数据元素; 以及将所述数据成员传送到多个曝光设备，所述多个曝光设备被配置为在与所述数据构件耦合时有入射能量束有条件地曝光所述衬底，其中一个像素元件的不同数据构件在不同的系统周期被传送。

公开(公告)号：US20150131077A1

公开(公告)日：2015-05-14

申请号：US14604488

申请日：2015-01-23

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC分类号： H01J37/317

CPC分类号： H01J37/3175 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/2485 ,  H01J2237/31762

摘要： An embodiment of a method of lithography includes generating a beam of electrons. A first pixel and a second pixel are each configured to pattern the beam. Using time domain multiplex loading, the first and second pixels are controlled such that the beam is patterned. The patterning includes receiving a first clock signal and using the first clock signal to generate a second clock signal and a third clock signal. The second clock signal is sent to the first pixel and sending the third clock signal is sent to the second pixel.

摘要翻译： 光刻方法的一个实施例包括产生电子束。 第一像素和第二像素都被配置为对光束进行图案化。 使用时域多路复用加载，控制第一和第二像素使得光束被图案化。 图案化包括接收第一时钟信号并使用第一时钟信号产生第二时钟信号和第三时钟信号。 第二时钟信号被发送到第一像素，并且发送第三时钟信号被发送到第二像素。