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公开(公告)号:US20250021085A1
公开(公告)日:2025-01-16
申请号:US18902234
申请日:2024-09-30
Applicant: Applied Materials, Inc.
Inventor: Milind Jayram Gadre
IPC: G05B19/418 , G06F16/901 , G06N20/00
Abstract: A method includes identifying a dependency graph of tasks of a substrate processing system. Responsive to determining that a first task of the tasks is unavailable, the method further includes determining an updated topological ordering of remaining tasks of a remaining subgraph of the dependency graph. The method further includes causing performance of the updated topological ordering of remaining tasks via the substrate processing system to produce one or more substrates.
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公开(公告)号:US12189375B2
公开(公告)日:2025-01-07
申请号:US17477023
申请日:2021-09-16
Applicant: Applied Materials, Inc.
Inventor: Milind Jayram Gadre
IPC: G05B19/418 , G06F16/901 , G06N20/00
Abstract: A method includes determining a plurality of dependencies associated with a plurality of tasks of a substrate processing system. The method further includes generating, based on the plurality of dependencies, a dependency graph of the plurality of tasks. The method further includes topologically sorting the dependency graph to generate one or more outputs. A schedule associated with processing a plurality of substrates in the substrate processing system is based on the one or more outputs.
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3.
公开(公告)号:US20240353812A1
公开(公告)日:2024-10-24
申请号:US18758450
申请日:2024-06-28
Applicant: APPLIED MATERIALS, INC.
Inventor: Milind Jayram Gadre , Prashanth Kumar
IPC: G05B19/406 , G06F16/901 , G06N20/00
CPC classification number: G05B19/406 , G06F16/9024 , G06N20/00 , G05B2219/33322
Abstract: A system includes a processing device, operatively coupled to the memory device, to perform operations comprising obtaining a plurality of sensor values associated with a deposition process performed, according to a recipe, in a process chamber to deposit film on a surface of a substrate. A machine-learning model is applied to the plurality of sensor values. The machine-learning model is trained based on historical sensor data of a sub-system of the process chamber and task data associated with the recipe for depositing the film. An output of the machine-learning model is generated that is indicative of a suspected failure of the sub-system and a corrective action is generated based on the suspected failure of the sub-system.
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4.
公开(公告)号:US12061458B2
公开(公告)日:2024-08-13
申请号:US17459433
申请日:2021-08-27
Applicant: APPLIED MATERIALS, INC.
Inventor: Milind Jayram Gadre , Prashanth Kumar
IPC: G05B19/406 , G06F16/901 , G06N20/00
CPC classification number: G05B19/406 , G06F16/9024 , G06N20/00 , G05B2219/33322
Abstract: A system includes a processing device, operatively coupled to the memory device, to perform operations comprising obtaining a plurality of sensor values associated with a deposition process performed, according to a recipe, in a process chamber to deposit film on a surface of a substrate; generating a manufacturing data graph based on the plurality of sensor values; receiving, via a user interface, a selection of a data point on the manufacturing graph; receiving failure data associated with the data point; and storing, in a data structure, the failure data to be accessible via the user interface presenting the manufacturing data graph.
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公开(公告)号:US20230195061A1
公开(公告)日:2023-06-22
申请号:US17558510
申请日:2021-12-21
Applicant: Applied Materials, Inc.
Inventor: Milind Jayram Gadre , Vivek Bharat Shah
CPC classification number: G05B13/048 , G05B19/188 , G05B13/0265 , G05B2219/40148
Abstract: A method includes receiving first data indicative of a range of values of a quality parameter of a type of manufacturing chamber component. Each value in the range of values meets one or more threshold criteria. The method further includes providing the first data to a physics-based model of a manufacturing chamber. The method further includes receiving, from the physics-based model, second data indicating a relationship between values of the quality parameter and predicted conditions in the manufacturing chamber. The method further includes determining, based on the relationship between values of the quality parameter and the predicted conditions, whether a new manufacturing chamber component of the manufacturing chamber component type is to be installed in the manufacturing chamber.
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6.
公开(公告)号:US20230061513A1
公开(公告)日:2023-03-02
申请号:US17459433
申请日:2021-08-27
Applicant: APPLIED MATERIALS, INC.
Inventor: Milind Jayram Gadre , Prashanth Kumar
IPC: G05B19/406 , G06N20/00 , G06F16/901
Abstract: A system includes a processing device, operatively coupled to the memory device, to perform operations comprising obtaining a plurality of sensor values associated with a deposition process performed, according to a recipe, in a process chamber to deposit film on a surface of a substrate; generating a manufacturing data graph based on the plurality of sensor values; receiving, via a user interface, a selection of a data point on the manufacturing graph; receiving failure data associated with the data point; and storing, in a data structure, the failure data to be accessible via the user interface presenting the manufacturing data graph.
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公开(公告)号:US20220091883A1
公开(公告)日:2022-03-24
申请号:US17477023
申请日:2021-09-16
Applicant: Applied Materials, Inc.
Inventor: Milind Jayram Gadre
IPC: G06F9/48 , G06F16/901 , G06N20/00
Abstract: A method includes determining a plurality of dependencies associated with a plurality of tasks of a substrate processing system. The method further includes generating, based on the plurality of dependencies, a dependency graph of the plurality of tasks. The method further includes topologically sorting the dependency graph to generate one or more outputs. A schedule associated with processing a plurality of substrates in the substrate processing system is based on the one or more outputs.
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