公开(公告)号：US20180122655A1

公开(公告)日：2018-05-03

申请号：US15784846

申请日：2017-10-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Vahid FIROUZDOR ,  Roberto COTLEAR ,  Michael NICHOLS ,  Imad YOUSIF ,  Steven E. BABAYAN ,  Rajinder DHINDSA ,  Changhun LEE

IPC: H01L21/67 ,  B01D39/20 ,  B01D46/24 ,  B01D46/10

CPC classification number: H01L21/67069 ,  B01D39/2027 ,  B01D46/10 ,  B01D46/2403 ,  B01D2239/1258 ,  B01D2275/202 ,  B01D2279/51

Abstract: Methods and apparatus for delivering one or more gases to a process chamber are provided herein. In some embodiments a gas delivery system includes a process chamber having an inner volume; a gas source panel; a gas line coupling the inner volume to the gas source panel; and a first gas filter disposed along the gas line proximate the inner volume, wherein the first gas filter comprises a filter element body having a first end and a second end opposite the first end, and a filtration efficiency of about 1 to about 5 log reduction value (LRV).