公开(公告)号：US20210317568A1

公开(公告)日：2021-10-14

申请号：US16846505

申请日：2020-04-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Chao DU ,  Xing CHEN ,  Keith A. MILLER ,  Jothilingam RAMALINGAM ,  Jianxin LEI

IPC: C23C14/34 ,  H01J37/32

Abstract: Methods and apparatus for passivating a target are provided herein. For example, a method includes a) supplying an oxidizing gas into an inner volume of the process chamber; b) igniting the oxidizing gas to form a plasma and oxidize at least one of a target or target material deposited on a process kit disposed in the inner volume of the process chamber; and c) performing a cycle purge comprising: c1) providing air into the process chamber to react with the at least one of the target or target material deposited on the process kit; c2) maintaining a predetermined pressure for a predetermined time within the process chamber to generate a toxic by-product caused by the air reacting with the at least one of the target or target material deposited on the process kit; and c3) exhausting the process chamber to remove the toxic by-product.

公开(公告)号：US20220307126A1

公开(公告)日：2022-09-29

申请号：US17838805

申请日：2022-06-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Chao DU ,  Xing CHEN ,  Keith A. MILLER ,  Jothilingam RAMALINGAM ,  Jianxin LEI

IPC: C23C14/34 ,  H01J37/32

Abstract: Methods and apparatus for passivating a target are provided herein. For example, a method includes a) supplying an oxidizing gas into an inner volume of the process chamber; b) igniting the oxidizing gas to form a plasma and oxidize at least one of a target or target material deposited on a process kit disposed in the inner volume of the process chamber; and c) performing a cycle purge comprising: c1) providing air into the process chamber to react with the at least one of the target or target material deposited on the process kit; c2) maintaining a predetermined pressure for a predetermined time within the process chamber to generate a toxic by-product caused by the air reacting with the at least one of the target or target material deposited on the process kit; and c3) exhausting the process chamber to remove the toxic by-product.