公开(公告)号：US20160056024A1

公开(公告)日：2016-02-25

申请号：US14522066

申请日：2014-10-23

Applicant: APPLIED MATERIALS, INC.

Inventor： WILLIAM JOHANSON ,  FUHONG ZHANG ,  ADOLPH MILLER ALLEN ,  YU LIU

IPC: H01J37/34 ,  C23C14/34

CPC classification number: H01J37/347 ,  C23C14/3492 ,  C23C14/50 ,  C23C14/54 ,  C23C14/542 ,  H01J37/32623 ,  H01J37/32733 ,  H01J2237/026

Abstract: Embodiments of improved methods and apparatus for maintaining low non-uniformity over the course of the life of a target are provided herein. In some embodiments, a method of processing a substrate in a physical vapor deposition chamber includes: disposing a substrate atop a substrate support having a cover ring that surrounds the substrate support such that an upper surface of the substrate is positioned at a first distance above an upper surface of the cover ring; sputtering a source material from a target disposed opposite the substrate support to deposit a film atop the substrate while maintaining the first distance; and lowering the substrate support with respect to the cover ring and sputtering the source material from the target to deposit films atop subsequent substrates over a life of the target.

Abstract translation: 本文提供了用于在目标寿命期间保持低不均匀性的改进方法和装置的实施例。 在一些实施例中，在物理气相沉积室中处理衬底的方法包括：在衬底支撑件顶部设置衬底，衬底支撑件具有围绕衬底支撑件的覆盖环，使得衬底的上表面位于第一距离 盖环的上表面; 从与衬底支撑件相对布置的靶溅射源材料，以在保持第一距离的同时在衬底上沉积膜; 以及相对于所述盖环降低所述基板支撑件并从所述靶溅射所述源材料以在所述目标的寿命期间将膜沉积在随后的基板上。