公开(公告)号：US20240151669A1

公开(公告)日：2024-05-09

申请号：US17984041

申请日：2022-11-09

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alex Goldenshtein ,  Dan Tuvia Fuchs

IPC: G01N27/02

CPC classification number: G01N27/021 ,  G01N27/028

Abstract: A method for evaluating an impedance related value of a structure of a sample, the method includes: (i) performing a first illumination iteration that includes charging the structure with an illumination iteration charge; (ii) performing a second illumination iteration that includes imaging the structure to provide an image of the structure; a value of the illumination iteration charge and a value of a time difference between step (i) and step (ii) are determined to introduce a dependency between an impedance of the structure and the image of the structure; wherein steps (i) and (ii) are executed using an electron beam, and (iii) determining the impedance related value of the structure based on the image of the structure. There may be three or more values of the impedance related value.