公开(公告)号：US20240177962A1

公开(公告)日：2024-05-30

申请号：US18072451

申请日：2022-11-30

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ofer Dudovitch ,  Ido Ben Noon ,  Efi Zertser

IPC: H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/24578

Abstract: A system for processing a sample comprising: a vacuum chamber having a window formed along one of its walls; a sample support configured to hold a sample within the vacuum chamber during a sample processing operation and move the substrate within the vacuum chamber along the X, Y and Z axes; a charged particle beam column configured to direct a charged particle beam into the vacuum chamber and focus the beam to collide with a region of interest on the sample; an optical distance measurement device configured to generate and direct electromagnetic radiation into the vacuum chamber through the window, detect photons from the electromagnetic radiation reflected off the sample, and determine a working distance between the sample and charged particle column based on the generated electromagnetic radiation and the detected photons; and one or more mirrors disposed within the vacuum chamber and positioned to direct the electromagnetic radiation generated by the optical distance measurement system to a measured location on the sample that is in close proximity to the region of interest, the one or more mirrors comprising at least one mirror positioned directly under a portion of the charged particle column.