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公开(公告)号:US11189451B2
公开(公告)日:2021-11-30
申请号:US17110167
申请日:2020-12-02
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor: Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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公开(公告)号:US10886092B2
公开(公告)日:2021-01-05
申请号:US16839986
申请日:2020-04-03
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor: Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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公开(公告)号:US20200234907A1
公开(公告)日:2020-07-23
申请号:US16839986
申请日:2020-04-03
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor: Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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公开(公告)号:US20210175040A1
公开(公告)日:2021-06-10
申请号:US17110167
申请日:2020-12-02
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor: Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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