公开(公告)号：US20230088313A1

公开(公告)日：2023-03-23

申请号：US17948674

申请日：2022-09-20

Applicant: ASM IP Holding, B.V.

Inventor： Herbert Terhorst ,  Dinkar Nandwana ,  Eric Shero ,  Allen D'Ambra ,  Jessica Akemi Cimada da Silva ,  Daner Abdula

IPC: B05B1/00 ,  B05B1/18

Abstract: A gas distribution system having a first plurality of apertures to supply a gas source to a reaction chamber and a second plurality of apertures surrounding the first plurality of apertures and configured to remove the gas from the reaction chamber. In one embodiment, the second plurality of apertures may gradually increase in diameter as the distance from a main exhaust channel increases. Alternatively, or in addition, the angle spacing between adjacent apertures may gradually decrease as the distance from the main exhaust channel increases.