公开(公告)号：US20250069911A1

公开(公告)日：2025-02-27

申请号：US18812488

申请日：2024-08-22

Applicant: ASM IP Holding B.V.

Inventor： Lucian Jdira ,  Johannes Maria Theodorus van Eijden ,  Theodorus G.M. Oosterlaken ,  Julien Laurentius Antonius Maria Keijser ,  Radko Bankras ,  Herbert Terhorst

IPC: H01L21/67 ,  H01L21/673

Abstract: An apparatus for processing a plurality of substrates is provided. The apparatus may have a process tube creating a process chamber and a door configured to support substrates in the process chamber and to seal the process chamber. The apparatus may have a gas injector to provide process gas into the process chamber. The gas injector may be operably connected to a process gas line in a purge chamber to purge the connection between the gas injector and the process gas line.

公开(公告)号：US11971217B2

公开(公告)日：2024-04-30

申请号：US17844911

申请日：2022-06-21

Applicant: ASM IP Holding B.V.

Inventor： Theodorus G. M. Oosterlaken ,  Lucian Jdira ,  Herbert Terhorst

IPC: F27B5/04 ,  F27B5/10 ,  F27B5/16 ,  F27B5/18 ,  F27D1/18 ,  F27D3/00

CPC classification number: F27B5/04 ,  F27B5/10 ,  F27B5/16 ,  F27B5/18 ,  F27D1/1858 ,  F27D3/0084

Abstract: Batch furnace assembly for processing wafers, comprising a process chamber housing defining a process chamber and having a process chamber opening, a wafer boat housing defining a water boat chamber, a door assembly, a differential pressure sensor, and a controller. The door assembly has a closed position in which it closes off the process chamber opening. The door assembly defines in a closed position a door assembly chamber having a purge gas inlet for supplying purge gas to the door assembly chamber for gas sealingly separating the process chamber from the wafer boat chamber. The differential pressure sensor assembly fluidly connects to the door assembly chamber and is configured to determine a pressure difference between a pressure in the door assembly chamber and a reference pressure in a reference pressure chamber. The controller is configured to establish whether the pressure difference is in a desired pressure range.

公开(公告)号：US20230008131A1

公开(公告)日：2023-01-12

申请号：US17810773

申请日：2022-07-05

Applicant: ASM IP Holding, B.V.

Inventor： Dieter Pierreux ,  Theodorus G.M Oosterlaken ,  Herbert Terhorst ,  Lucian Jdira ,  Bert Jongbloed

IPC: C23C16/44 ,  C23C16/34 ,  C23C16/52 ,  C23C16/455

Abstract: A chemical vapor deposition furnace for depositing silicon nitride films is disclosed. The furnace having a process chamber elongated in a substantially vertical direction and a wafer boat for supporting a plurality of wafers in the process chamber. A process gas injector inside the process chamber is provided with a plurality of vertically spaced gas injection holes to provide gas introduced at a feed end in an interior of the process gas injector to the process chamber. A valve system connected to the feed end of the process gas injector is being constructed and arranged to connect a source of a silicon precursor and a nitrogen precursor to the feed end for depositing silicon nitride layers. The valve system may connect the feed end of the process gas injector to a cleaning gas system to provide a cleaning gas to remove silicon nitride from the process gas injector and/or the processing chamber.

公开(公告)号：US20220349060A1

公开(公告)日：2022-11-03

申请号：US17810115

申请日：2022-06-30

Applicant: ASM IP HOLDING B.V.

Inventor： David Marquardt ,  Andrew Michael Yednak, III ,  Eric James Shero ,  Herbert Terhorst

IPC: C23C16/455 ,  H01L21/02 ,  H01L21/285

Abstract: A semiconductor device comprising a manifold for uniform vapor deposition is disclosed. The semiconductor device can include a manifold comprising a bore and having an inner wall. The inner wall can at least partially define the bore. A first axial portion of the bore can extend along a longitudinal axis of the manifold. A supply channel can provide fluid communication between a gas source and the bore. The supply channel can comprise a slit defining an at least partially annular gap through the inner wall of the manifold to deliver a gas from the gas source to the bore. The at least partially annular gap can be revolved about the longitudinal axis.

公开(公告)号：US20190093221A1

公开(公告)日：2019-03-28

申请号：US16130798

申请日：2018-09-13

Applicant: ASM IP Holding B.V.

Inventor： Lucian Jdira ,  Herbert Terhorst ,  Naoto Tsuji ,  Yoshio Susa

IPC: C23C16/448 ,  C23C16/455

Abstract: An apparatus for dispensing a vapor phase reactant to a reaction chamber is disclosed. The apparatus may include: a first chamber configured for holding a source chemical with a first fill level; and a second chamber configured for holding the source chemical with a second fill level and in fluid communication with the first chamber via a fluid channel below the first and second fill levels. The apparatus may also include: a second chamber inlet opening in fluid communication with a pressurizing gas feed provided with a flow controller configured for controlling a flow of a pressurizing gas in the second chamber to control the first fill level in the first chamber. Methods for dispensing a vapor phase reactant are also provided.

公开(公告)号：US20240384411A1

公开(公告)日：2024-11-21

申请号：US18788528

申请日：2024-07-30

Applicant: ASM IP Holding B.V.

Inventor： Kornelius Haanstra ,  Lucian C. Jdira ,  Chris G.M. de Ridder ,  Robin Roelofs ,  Werner Knaepen ,  Herbert Terhorst

IPC: C23C16/455 ,  C23C16/458 ,  H01L21/673 ,  H01L21/687

Abstract: A substrate processing apparatus having a tube, a closed liner lining the interior surface of the tube, a plurality of gas injectors to provide a gas to an inner space of the liner, and, a gas exhaust duct to remove gas from the inner space is disclosed. The liner may have a substantially cylindrical wall delimited by a liner opening at a lower end and being substantially closed for gases above the liner opening. The apparatus may have a boat constructed and arranged moveable into the inner space via the liner opening and provided with a plurality of substrate holders for holding a plurality of substrates over a substrate support length in the inner space. Each of the gas injectors may have a single exit opening at the top and the exit openings of the plurality of injectors are substantially equally divided over the substrate support length.

公开(公告)号：US12077854B2

公开(公告)日：2024-09-03

申请号：US17810773

申请日：2022-07-05

Applicant: ASM IP Holding, B.V.

Inventor： Dieter Pierreux ,  Theodorus G. M. Oosterlaken ,  Herbert Terhorst ,  Lucian Jdira ,  Bert Jongbloed

IPC: C23C16/44 ,  C23C16/34 ,  C23C16/455 ,  C23C16/458 ,  C23C16/52

CPC classification number: C23C16/4405 ,  C23C16/345 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/4583 ,  C23C16/52

Abstract: A chemical vapor deposition furnace for depositing silicon nitride films is disclosed. The furnace includes a process chamber elongated in a substantially vertical direction and a wafer boat for supporting a plurality of wafers in the process chamber. A process gas injector inside the process chamber is provided with vertically spaced gas injection holes to provide gas introduced at a feed end in an interior of the process gas injector to the process chamber. A valve system connected to the feed end of the process gas injector is being constructed and arranged to connect a source of a silicon precursor and a nitrogen precursor to the feed end for depositing silicon nitride layers. The valve system may connect the feed end of the process gas injector to a cleaning gas system to provide a cleaning gas to remove silicon nitride from the process gas injector and/or the process chamber.

公开(公告)号：US20240209501A1

公开(公告)日：2024-06-27

申请号：US18596144

申请日：2024-03-05

Applicant: ASM IP Holding B.V.

Inventor： Mohith Verghese ,  Eric James Shero ,  Carl Louis White ,  Kyle Fondurulia ,  Herbert Terhorst

IPC: C23C16/448 ,  C23C16/455

CPC classification number: C23C16/4481 ,  C23C16/45544

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

公开(公告)号：US20230008684A1

公开(公告)日：2023-01-12

申请号：US17810759

申请日：2022-07-05

Applicant: ASM IP Holding B.V

Inventor： Theodorus G.M. Oosterlaken ,  Adriaan Garssen ,  Herbert Terhorst ,  Lucian Jdira

IPC: F27B17/00 ,  H01L21/67 ,  F27B5/16

Abstract: An apparatus 1 for processing a plurality of substrates 3 is provided. The apparatus may have a process tube 5 creating a process chamber 7; a heater 9 surrounding the process tube 5; a flange 11 for supporting the process tube; and a door 15 configured to support a wafer boat 17 with a plurality of substrates 3 in the process chamber and to seal the process chamber 7. An exhaust operably connected to the process chamber 7 may be provided to remove gas from the process chamber via a first exhaust duct 19. The apparatus may be provided with an extractor chamber 21 surrounding the first exhaust duct where it connects to the process chamber and connected to a second exhaust duct 23 to remove gas from the extractor chamber.

公开(公告)号：US10605530B2

公开(公告)日：2020-03-31

申请号：US15660805

申请日：2017-07-26

Applicant: ASM IP Holding B.V.

Inventor： Lucian C. Jdira ,  Chris G. M. de Ridder ,  Theodorus G. M. Oosterlaken ,  Klaas P. Boonstra ,  Herbert Terhorst ,  Juul Keijser

IPC: F27D7/06 ,  F27B5/04 ,  F27B1/14 ,  F27B1/28 ,  F27B5/08 ,  F27B5/12 ,  F27B5/16 ,  F27D3/00 ,  F27D11/00 ,  H01L21/67

Abstract: An assembly of a liner and a flange for a vertical furnace for processing substrates is provided. The liner being configured to extend in the interior of a process tube of the vertical furnace, and the flange is configured to at least partially close a liner opening. The liner comprising a substantially cylindrical wall delimited by the liner opening at a lower end and closed at a higher end and being substantially closed for gases above the liner opening and defining an inner space. The flange comprising: an inlet opening configured to insert and remove a boat configured to carry substrates in the inner space of the liner; a gas inlet to provide a gas to the inner space. The assembly is constructed and arranged with a gas exhaust opening to remove gas from the inner space and a space between the liner and the low pressure tube.