公开(公告)号：US20240084446A1

公开(公告)日：2024-03-14

申请号：US18465787

申请日：2023-09-12

Applicant: ASM IP Holding, B.V.

Inventor： Iordan Iordanov ,  Christiaan Werkhoven ,  Loke Yuen Wong ,  Ivo Johannes Raaijmakers ,  Osama Khalil

IPC: C23C16/40 ,  C23C16/32 ,  C23C16/34 ,  C23C16/455 ,  C23C16/458

CPC classification number: C23C16/40 ,  C23C16/325 ,  C23C16/34 ,  C23C16/45553 ,  C23C16/458

Abstract: A reaction chamber component for use in a deposition apparatus for depositing a layer of a first material on a substrate is provided. The component may have a base material being partially coated with a liner of the first material. The component may have a protective layer of a second material different than the first material on top of the liner of the first material to protect the component. This may be useful during a removal process for removing a parasitic coating of the same first material deposited during use of the reaction chamber component.