专利检索 ap:("ASM IP Holding B. V.") AND inv:"Daniele Piumi" 第 1 页

1.

发明公开
METHODS FOR FORMING AND UTILIZING ANTIMONY CONTAINING FILMS, AND RELATED STRUCTURES 审中-公开

公开(公告)号：US20240218510A1

公开(公告)日：2024-07-04

申请号：US18398894

申请日：2023-12-28

申请人： ASM IP Holding B. V.

发明人： Paul Chatelain , Arpita Saha , David Kurt de Roest , Yoann Tomczak , Charles Dezelah , Daniele Piumi

IPC分类号： C23C16/455 , C23C16/18 , C23C16/56

CPC分类号： C23C16/45542 , C23C16/18 , C23C16/45553 , C23C16/56

摘要： Systems and methods for forming an antimony containing film on a substrate. Related structures and films are also disclosed. The antimony films are be formed by a plasma enhanced atomic layer deposition process. The antimony films can be utilized as underlayers in EUV lithography processes.