公开(公告)号：US20240218514A1

公开(公告)日：2024-07-04

申请号：US18395006

申请日：2023-12-22

Applicant: ASM IP Holding B.V.

Inventor： Christopher Falcone ,  Dinkar Nandwana ,  Kyle Fondurulia ,  Vishnu Shakti

IPC: C23C16/52 ,  C23C16/455 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/45565 ,  C23C16/45589 ,  C23C16/4583

Abstract: Methods and apparatuses for adjusting a process chamber volume are described. For example, a process chamber, after removing at least a component used to perform a function associated with the process chamber, may be installed with a fixture to adjust a volume of the process chamber. The process chamber with the fixture may reduce the amount of precursor gases and processing time for coating a workpiece. The workpiece, after the coating, may be placed in another process chamber to perform a function associated with the other process chamber.