公开(公告)号：US20210054504A1

公开(公告)日：2021-02-25

申请号：US16996886

申请日：2020-08-18

Applicant: ASM IP Holding B.V.

Inventor： Hua Feng Wang ,  Yozo Ikedo

IPC: C23C16/448 ,  C23C16/40 ,  C23C16/52

Abstract: There is provided a film-forming material mixed-gas forming device including: a film-forming material supply unit that supplies a film-forming material in liquid form at a predetermined flow rate; a carrier gas supply unit that supplies a carrier gas at a predetermined flow rate; a main vaporization unit that vaporizes the film-forming material by heating the film-forming material supplied from the film-forming material supply unit and the carrier gas supplied from the carrier gas supply unit; and an auxiliary vaporization unit having a porous vaporization member which captures carried over droplets of the film-forming material in gas flowing out from the main vaporization unit and vaporizes the captured droplets of the film-forming material.

公开(公告)号：US11639548B2

公开(公告)日：2023-05-02

申请号：US16996886

申请日：2020-08-18

Applicant: ASM IP Holding B.V.

Inventor： Hua Feng Wang ,  Yozo Ikedo

IPC: C23C16/448 ,  C23C16/52 ,  C23C16/40

Abstract: There is provided a film-forming material mixed-gas forming device including: a film-forming material supply unit that supplies a film-forming material in liquid form at a predetermined flow rate; a carrier gas supply unit that supplies a carrier gas at a predetermined flow rate; a main vaporization unit that vaporizes the film-forming material by heating the film-forming material supplied from the film-forming material supply unit and the carrier gas supplied from the carrier gas supply unit; and an auxiliary vaporization unit having a porous vaporization member which captures carried over droplets of the film-forming material in gas flowing out from the main vaporization unit and vaporizes the captured droplets of the film-forming material.