公开(公告)号：US20210054504A1

公开(公告)日：2021-02-25

申请号：US16996886

申请日：2020-08-18

Applicant: ASM IP Holding B.V.

Inventor： Hua Feng Wang ,  Yozo Ikedo

IPC: C23C16/448 ,  C23C16/40 ,  C23C16/52

Abstract: There is provided a film-forming material mixed-gas forming device including: a film-forming material supply unit that supplies a film-forming material in liquid form at a predetermined flow rate; a carrier gas supply unit that supplies a carrier gas at a predetermined flow rate; a main vaporization unit that vaporizes the film-forming material by heating the film-forming material supplied from the film-forming material supply unit and the carrier gas supplied from the carrier gas supply unit; and an auxiliary vaporization unit having a porous vaporization member which captures carried over droplets of the film-forming material in gas flowing out from the main vaporization unit and vaporizes the captured droplets of the film-forming material.

公开(公告)号：USD829306S1

公开(公告)日：2018-09-25

申请号：US29570199

申请日：2016-07-06

Applicant: ASM IP Holding B.V.

Designer： Yozo Ikedo ,  Takafumi Hisamitsu

公开(公告)号：USD864134S1

公开(公告)日：2019-10-22

申请号：US29667702

申请日：2018-10-24

Applicant: ASM IP Holding B.V.

Designer： Toshiharu Watarai ,  Yozo Ikedo ,  Takuya Suguri

公开(公告)号：US10526704B2

公开(公告)日：2020-01-07

申请号：US14609758

申请日：2015-01-30

Applicant: ASM IP Holding B.V.

Inventor： Yuya Nonaka ,  Yozo Ikedo

IPC: C23C16/00 ,  C23C16/455 ,  C23C16/50

Abstract: A film forming apparatus includes a chamber having a processing space, a stage provided in the processing space and having a substrate placed thereon, a diffusion tube connected to the chamber so that a diffusion space communicating with the processing space is provided right above the stage, and a gas supply tube extending from the outside of the diffusion tube into the diffusion space through a portion of the diffusion tube and having a gas supply orifice in a portion thereof inside of the diffusion space. The gas supply orifice is formed so as to eject a material gas in a direction away from the stage.

公开(公告)号：US11639548B2

公开(公告)日：2023-05-02

申请号：US16996886

申请日：2020-08-18

Applicant: ASM IP Holding B.V.

Inventor： Hua Feng Wang ,  Yozo Ikedo

IPC: C23C16/448 ,  C23C16/52 ,  C23C16/40

Abstract: There is provided a film-forming material mixed-gas forming device including: a film-forming material supply unit that supplies a film-forming material in liquid form at a predetermined flow rate; a carrier gas supply unit that supplies a carrier gas at a predetermined flow rate; a main vaporization unit that vaporizes the film-forming material by heating the film-forming material supplied from the film-forming material supply unit and the carrier gas supplied from the carrier gas supply unit; and an auxiliary vaporization unit having a porous vaporization member which captures carried over droplets of the film-forming material in gas flowing out from the main vaporization unit and vaporizes the captured droplets of the film-forming material.

公开(公告)号：US10435789B2

公开(公告)日：2019-10-08

申请号：US15370834

申请日：2016-12-06

Applicant: ASM IP Holding B.V.

Inventor： Naoto Tsuji ,  Takuya Suguri ,  Yozo Ikedo

IPC: H01L21/00 ,  C23C16/00 ,  C23C16/50 ,  H01J37/00 ,  H01L21/683 ,  C23C16/503

Abstract: A substrate treatment apparatus includes a lower electrode, an upper electrode, a first AC power supply that is connected to the upper electrode and supplies AC power at a first frequency, a second AC power supply that is connected to the upper electrode and supplies AC power at a second frequency which is lower than the first frequency, an internal electrode provided in the lower electrode, a filter circuit connected to the internal electrode, and a DC power supply connected to the internal electrode via the filter circuit. The filter circuit includes a first filter circuit that becomes low impedance with respect to AC power at the first frequency compared to AC power at the second frequency, and a second filter circuit that becomes low impedance with respect to AC power at the second frequency compared to AC power at the first frequency.