公开(公告)号：US20170044666A1

公开(公告)日：2017-02-16

申请号：US15232603

申请日：2016-08-09

Applicant: ASM IP Holding B.V.

Inventor： Hyun Soo Jang ,  Jeong Ho Kee ,  Woo Chan Kim ,  Sung Hoon Jun ,  Jong Won Shon

IPC: C23C16/458 ,  C23C16/455

Abstract: Disclosed are a substrate holder and a semiconductor manufacturing apparatus including the substrate holder. The substrate holder provides a reaction region by making face-sealing contact with a reactor wall. The substrate holder has an elastic behavior when pressure is applied thereto while the substrate holder makes face-sealing contact with the reactor wall. The semiconductor manufacturing apparatus includes the substrate holder and a gas supply unit configured to supply gas to the reaction region provided by the reactor wall and the substrate holder.

Abstract translation: 公开了一种衬底保持器和包括衬底保持器的半导体制造设备。 衬底保持器通过与反应器壁进行面密封接触来提供反应区域。 当衬底保持器与反应器壁进行面密封接触时，衬底保持器具有施加压力的弹性。 半导体制造装置包括衬底保持器和气体供给单元，该气体供给单元构造成将气体供应到由反应器壁和衬底保持器提供的反应区域。