公开(公告)号：US20180350653A1

公开(公告)日：2018-12-06

申请号：US15985539

申请日：2018-05-21

Applicant: ASM IP Holding B.V.

Inventor： Sang Jin Jeong ,  Jeung Hoon Han ,  Young Seok Choi ,  Ju Hyuk Park

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/02 ,  H01J37/32 ,  C23C16/455 ,  C23C16/505

Abstract: Provided is a substrate supporting device which prevents intrusion of a process gas into a rear surface of a substrate in a high-temperature process. The substrate supporting device includes a support portion configured to have a line contact with an edge exclusion zone of the substrate that is deformed at a specific temperature.

公开(公告)号：USD830981S1

公开(公告)日：2018-10-16

申请号：US29604288

申请日：2017-05-16

Applicant: ASM IP Holding B.V.

Designer： Sang Jin Jeong ,  Jeung Hoon Han ,  Young Seok Choi ,  Ju Hyuk Park