Gas flow control plate
    3.
    外观设计

    公开(公告)号:USD990441S1

    公开(公告)日:2023-06-27

    申请号:US29806823

    申请日:2021-09-07

    Abstract: FIG. 1 is a top perspective view of the gas flow control plate, showing our new design;
    FIG. 2 is a bottom perspective view thereof;
    FIG. 3 is a top view thereof;
    FIG. 4 is a bottom view thereof;
    FIG. 5 is a front view thereof;
    FIG. 6 is a back view thereof;
    FIG. 7 is a right side view thereof; and,
    FIG. 8 is a left side view thereof.

    Electrode for substrate processing apparatus

    公开(公告)号:USD1023959S1

    公开(公告)日:2024-04-23

    申请号:US29782976

    申请日:2021-05-11

    Abstract: FIG. 1 is a top perspective view of an electrode for substrate processing apparatus showing our new design;
    FIG. 2 is a bottom perspective view thereof;
    FIG. 3 is a top plan view thereof;
    FIG. 4 is a bottom plan view thereof;
    FIG. 5 is a side elevation view thereof; and,
    FIG. 6 is a cross-sectional view, taken along a line 6-6 of FIG. 3.

    Gas distributor for semiconductor manufacturing apparatus

    公开(公告)号:USD1005974S1

    公开(公告)日:2023-11-28

    申请号:US29839254

    申请日:2022-05-19

    Abstract: FIG. 1 is a top perspective view of a gas distributor for semiconductor manufacturing apparatus, showing our new design;
    FIG. 2 is a bottom perspective view thereof;
    FIG. 3 is a top view thereof;
    FIG. 4 is a bottom view thereof;
    FIG. 5 is a front side view thereof;
    FIG. 6 is a back side view thereof;
    FIG. 7 is a right side view thereof;
    FIG. 8 is a left side view thereof; and,
    FIG. 9 is a cross sectional view taken along line 9-9 in FIG. 3.

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