公开(公告)号：US20240124981A1

公开(公告)日：2024-04-18

申请号：US18377885

申请日：2023-10-09

Applicant: ASM IP Holding B.V.

Inventor： Arun Thottappayil ,  DongRak Jung ,  JongSu Kim

IPC: C23C16/455

CPC classification number: C23C16/45565

Abstract: A gas inlet tube assembly is presented. The assembly comprising a first inlet configured to insert a first process gas and a second inlet configured to insert a second process gas; a gas inlet tube configured to mix the first process gas from the first inlet and the second process gas from the second inlet, the gas inlet tube being in fluid communication with a reaction chamber of the substrate processing apparatus, comprising upper and lower segments, wherein the first inlet and the second inlet are placed in the upper segment of the gas inlet tube and face with each other directly opposite, the upper segment is converging cone shape, the lower segment is diverging cone shape, the ratio of the length of the upper segment bottom to the length of the lower segment bottom can be 0.1˜0.9, preferably 0.15˜0.25.

公开(公告)号：US11866823B2

公开(公告)日：2024-01-09

申请号：US17967035

申请日：2022-10-17

Applicant: ASM IP Holding B.V.

Inventor： SeungHwan Lee ,  HakYong Kwon ,  JongSu Kim ,  SungBae Kim ,  JuHyuk Park

IPC: C23C16/455 ,  H01J37/32 ,  H01L21/67 ,  H01L21/673 ,  C23C16/458 ,  H01L21/687

CPC classification number: C23C16/45544 ,  C23C16/458 ,  C23C16/45536 ,  H01J37/3244 ,  H01J37/32082 ,  H01J37/32211 ,  H01L21/673 ,  H01L21/67017 ,  H01L21/67103 ,  H01L21/6875 ,  H01L21/68735

Abstract: A substrate processing device capable of preventing deformation of a substrate during a process includes a substrate supporting unit having a contact surface that comes into contact with an edge of a substrate to be processed, wherein the substrate supporting unit includes a protruding (e.g. embossed) structure protruding from a base to support deformation from the inside of the edge of the substrate to be processed.

公开(公告)号：US20230052239A1

公开(公告)日：2023-02-16

申请号：US17967035

申请日：2022-10-17

Applicant: ASM IP Holding B.V.

Inventor： SeungHwan Lee ,  HakYong Kwon ,  JongSu Kim ,  SungBae Kim ,  JuHyuk Park

IPC: H01L21/687 ,  H01L21/67 ,  H01J37/32

Abstract: A substrate processing device capable of preventing deformation of a substrate during a process includes a substrate supporting unit having a contact surface that comes into contact with an edge of a substrate to be processed, wherein the substrate supporting unit includes a protruding (e.g. embossed) structure protruding from a base to support deformation from the inside of the edge of the substrate to be processed.

公开(公告)号：USD981973S1

公开(公告)日：2023-03-28

申请号：US29782975

申请日：2021-05-11

Applicant: ASM IP Holding B.V.

Designer： JaeHyun Kim ,  JeongHo Lee ,  JinHo Shin ,  JongSu Kim

公开(公告)号：US11499226B2

公开(公告)日：2022-11-15

申请号：US16671847

申请日：2019-11-01

Applicant: ASM IP Holding B.V.

Inventor： SeungHwan Lee ,  HakYong Kwon ,  JongSu Kim ,  SungBae Kim ,  JuHyuk Park

IPC: C23C16/455 ,  H01J37/32 ,  H01L21/67 ,  H01L21/673 ,  C23C16/458

Abstract: A substrate processing device capable of preventing deformation of a substrate during a process includes a substrate supporting unit having a contact surface that comes into contact with an edge of a substrate to be processed, wherein the substrate supporting unit includes a protruding (e.g. embossed) structure protruding from a base to support deformation from the inside of the edge of the substrate to be processed.