METHOD, SYSTEM AND APPARATUS FOR SUBSTRATE HANDLING AND COOLING

    公开(公告)号:US20240178033A1

    公开(公告)日:2024-05-30

    申请号:US18523172

    申请日:2023-11-29

    CPC classification number: H01L21/67742 H01L21/67109 H01L21/68707

    Abstract: A substrate cooling apparatus includes a cooling plate with a top surface including an array of embedded substrate support members protruding therefrom. A channel is disposed in an underside portion of the cooling plate, the conduit is embedded in the channel, a conduit comprising a coolant inlet at a first end and a coolant outlet at a second end, and a viscous thermally conductive material is disposed in the channel and is thermally coupled to an interior surface of the channel and an exterior surface of the conduit. One or more open recesses are disposed in a top surface of the cooling plate extending inward from a perimeter of the cooling plate toward a center point of the cooling plate, the open recesses disposed circumferentially on diametrically opposite sides of the cooling plate wherein the open recesses are sized to receive a corresponding substrate handling member of an indexer. Substrate transfer systems, cooling plate arrangements, and substrate transfer methods are also described.

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