公开(公告)号：US20190390345A1

公开(公告)日：2019-12-26

申请号：US16014320

申请日：2018-06-21

Applicant: ASM IP Holding B.V.

Inventor： Takashi WADA ,  Satoru NOGUCHI ,  Wataru ADACHI ,  Daisuke MURAMATSU

IPC: C23C16/52 ,  C23C16/455

Abstract: Examples of a substrate processing apparatus includes a device for subjecting a substrate to processing, and a controller for modifying a control parameter predetermined to control the device with a first modification value and a second modification value that vary over time, thereby calculating a modified parameter, and controlling the device based on the modified parameter, wherein the first modification value has a shorter term for modifying the control parameter than the second modification value.

公开(公告)号：US20150309504A1

公开(公告)日：2015-10-29

申请号：US14264698

申请日：2014-04-29

Applicant: ASM IP HOLDING B.V.

Inventor： Takashi WADA

IPC: G05B19/418

CPC classification number: G05B19/4189 ,  G05B2219/45031 ,  H01L21/67742 ,  H01L21/67745 ,  Y02P90/20 ,  Y02P90/28

Abstract: A substrate processing apparatus includes a plurality of arms used for transferring a substrate, a plurality of processing sections for processing the substrate, a recipe storage section storing at least one recipe for designating at least one of the plurality of arms as a usable arm and at least one of the plurality of processing sections as a usable processing section and for specifying processing conditions in the usable processing section, and a control unit for, according to the at least one recipe, controlling the plurality of arms and the plurality of processing sections so that a substrate is transferred using the usable arm and is processed in the usable processing section under the processing conditions.

Abstract translation: 基板处理装置包括用于转印基板的多个臂，用于处理基板的多个处理部分，存储用于指定多个臂中的至少一个作为可用臂的至少一个配方的配方存储部， 所述多个处理部中的至少一个作为可用处理部，并且用于指定可用处理部中的处理条件，以及控制单元，用于根据至少一个配方控制多个臂和多个处理部分 使用可使用的臂转移基板，并在处理条件下在可用处理部中进行处理。