公开(公告)号：US20220134480A1

公开(公告)日：2022-05-05

申请号：US17431538

申请日：2020-02-03

Applicant: ASML Holding N.V.

Inventor： Damoon SOHRABIBABAHEIDARY ,  Christopher John MASON ,  Peter HELMUS ,  Mehmet Ali AKBAS ,  Bensely ALBERT ,  Benjamin David DAWSON

IPC: B23K26/352 ,  G03F7/20 ,  B23K26/06

Abstract: Methods, computer program products, and apparatuses for reducing sticking during a lithography process are disclosed. An exemplary method of reducing sticking of an object to a modified surface that is used to support the object in a lithography process can include controlling a light source to deliver light to a native surface thereby causing ablation of at least a portion of the native surface to increase the roughness of the native surface thereby forming the modified surface. The increased roughness reduces the ability of the object to stick to the modified surface.