公开(公告)号：US20220134480A1

公开(公告)日：2022-05-05

申请号：US17431538

申请日：2020-02-03

Applicant: ASML Holding N.V.

Inventor： Damoon SOHRABIBABAHEIDARY ,  Christopher John MASON ,  Peter HELMUS ,  Mehmet Ali AKBAS ,  Bensely ALBERT ,  Benjamin David DAWSON

IPC: B23K26/352 ,  G03F7/20 ,  B23K26/06

Abstract: Methods, computer program products, and apparatuses for reducing sticking during a lithography process are disclosed. An exemplary method of reducing sticking of an object to a modified surface that is used to support the object in a lithography process can include controlling a light source to deliver light to a native surface thereby causing ablation of at least a portion of the native surface to increase the roughness of the native surface thereby forming the modified surface. The increased roughness reduces the ability of the object to stick to the modified surface.

公开(公告)号：US20210405539A1

公开(公告)日：2021-12-30

申请号：US17291086

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali AKBAS ,  Tammo UITTERDIJK ,  Christopher John MASON ,  Matthew LIPSON ,  David Hart PETERSON ,  Michael PERRY ,  Peter HELMUS ,  Jerry Jianguo DENG ,  Damoon SOHRABIBABAHEIDARY

IPC: G03F7/20 ,  H01L21/687

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

公开(公告)号：US20240369947A1

公开(公告)日：2024-11-07

申请号：US18773176

申请日：2024-07-15

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali AKBAS ,  Tammo UITTERDIJK ,  Christopher John MASON ,  Matthew LIPSON ,  David Hart PETERSON ,  Michael PERRY ,  Peter HELMUS ,  Jerry Jianguo DENG ,  Damoon SOHRABIBABAHEIDARY

IPC: G03F7/00 ,  H01L21/687

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.