Lithographic apparatus, metrology system, and illumination systems with structured illumination

    公开(公告)号:US11789368B2

    公开(公告)日:2023-10-17

    申请号:US17764139

    申请日:2020-09-14

    CPC classification number: G03F7/70191 G03F7/7085 G03F7/70091

    Abstract: A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation.

    Wafer alignment using form birefringence of targets or product

    公开(公告)号:US11971665B2

    公开(公告)日:2024-04-30

    申请号:US17432019

    申请日:2020-02-06

    CPC classification number: G03F9/7065 G03F9/7076 G03F9/7088

    Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.

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