专利检索 ap:("ASML Holding N.V.") AND inv:"Michael Leo NELSON" 第 1 页

1.

发明公开
SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGNMENT APPARATUS 审中-公开

公开(公告)号：US20240077308A1

公开(公告)日：2024-03-07

申请号：US18260817

申请日：2022-01-04

申请人： ASML Holding N.V.

发明人： Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX , Michael Leo NELSON , Muhsin ERALP

IPC分类号： G01B11/27 , G03F7/20

CPC分类号： G01B11/272 , G03F7/20

摘要： A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.

2.

发明申请
CHUCKS AND CLAMPS FOR HOLDING OBJECTS OF A LITHOGRAPHIC APPARATUS AND METHODS FOR CONTROLLING A TEMPERATURE OF AN OBJECT HELD BY A CLAMP OF A LITHOGRAPHIC APPARATUS 审中-公开

公开(公告)号：US20180321602A1

公开(公告)日：2018-11-08

申请号：US15764594

申请日：2016-10-05

申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE , Adrianus Hendrik KOEVOETS , Michael Leo NELSON , Jacobus Cornelis Gerardus VAN DER SANDEN , Geoffrey O'CONNOR , Michael Andrew CHIEDA , Tammo UITTERDIJK

IPC分类号： G03F7/20 , H01L21/683

CPC分类号： G03F7/70875 , G03F7/707 , G03F7/70783 , H01L21/67109 , H01L21/67115 , H01L21/67248 , H01L21/6831

摘要： A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.