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公开(公告)号：US20230266255A1
公开(公告)日：2023-08-24
申请号：US18012801
申请日：2021-06-09
发明人： Ilse VAN WEPEREN , Arjan Johannes Anton BEUKMAN , Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N2021/95676
摘要： Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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2.发明公开公开(公告)号：US20230142459A1
公开(公告)日：2023-05-11
申请号：US17918426
申请日：2021-04-08
申请人： ASML Holding N.V.
发明人： Andrew JUDGE , Ravi Chaitanya KALLURI , Michal Emanuel PAWLOWSKI , James Hamilton WALSH , Justin Lloyd KREUZER
CPC分类号： G03F1/84 , G01N21/94 , G01N21/4795 , G01N21/8806 , G01N21/8851 , G03F7/2004 , G01N2021/8896
摘要： An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.
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公开(公告)号：US20230008139A1
公开(公告)日：2023-01-12
申请号：US17782622
申请日：2020-11-18
摘要： A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
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公开(公告)号：US20180299790A1
公开(公告)日：2018-10-18
申请号：US15766427
申请日：2016-10-06
申请人： ASML Holding N.V.
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F9/7046 , G03F9/7049 , G03F9/7065 , G03F9/7069 , G03F9/7088
摘要： A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
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5.发明公开公开(公告)号：US20240094641A1
公开(公告)日：2024-03-21
申请号：US18255543
申请日：2021-12-02
发明人： Justin Lloyd KREUZER , Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Filippo ALPEGGIANI
IPC分类号： G03F7/00
CPC分类号： G03F7/70633 , G03F7/706837 , G03F7/706849
摘要： The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.
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公开(公告)号：US20240077308A1
公开(公告)日：2024-03-07
申请号：US18260817
申请日：2022-01-04
申请人： ASML Holding N.V.
CPC分类号： G01B11/272 , G03F7/20
摘要： A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.
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公开(公告)号：US20220179331A1
公开(公告)日：2022-06-09
申请号：US17600174
申请日：2020-03-25
申请人： ASML HOLDING N.V.
发明人： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Justin Lloyd KREUZER , Yuxiang LIN , Kirill Urievich SOBOLEV
IPC分类号： G03F9/00
摘要： Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
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公开(公告)号：US20160223920A1
公开(公告)日：2016-08-04
申请号：US15023075
申请日：2014-09-11
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Simon Gijsbert Josephus MATHIJSSEN
CPC分类号： G03F9/7069 , G01B9/02011 , G01B9/02015 , G01B11/272 , G01B2290/70 , G03F9/7049 , G03F9/7088
摘要： Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
摘要翻译： 装置，系统和方法用于使用偏振无关干涉仪来检测基板上特征的对准。 该装置，系统和方法包括从基板上的标记衍射或散射的光的光学元件。 光学元件可以将衍射光分成由一个或多个检测器检测的多个子光束。 衍射光可以在光学上或在检测后的处理期间组合。 该系统可以基于接收到的具有任何偏振角或状态的衍射光来确定对准和/或覆盖。
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公开(公告)号：US20230266681A1
公开(公告)日：2023-08-24
申请号：US18012799
申请日：2021-06-09
申请人： ASML Holding N.V.
IPC分类号： G03F9/00
CPC分类号： G03F9/7019 , G03F9/7065
摘要： Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.
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公开(公告)号：US20230116318A1
公开(公告)日：2023-04-13
申请号：US17798040
申请日：2021-01-21
申请人： ASML Holding N.V.
摘要： An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
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