公开(公告)号：US20180373156A1

公开(公告)日：2018-12-27

申请号：US16062735

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Björn Hubertus Maria BUKKEMS ,  Cornelius Adrianus Lambertus DE HOON ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/70833

Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.