IMPRINT LITHOGRAPHY
    3.
    发明申请

    公开(公告)号:US20160377997A1

    公开(公告)日:2016-12-29

    申请号:US15258903

    申请日:2016-09-07

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00 G03F9/7042

    Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

    Abstract translation: 公开了一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中,该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域,检测从该区域反射或发射的辐射的强度,以及识别对准 通过分析检测到的强度来标记。

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