公开(公告)号：US20180088468A1

公开(公告)日：2018-03-29

申请号：US15828523

申请日：2017-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  B29C43/02 ,  B82Y40/00 ,  B82Y10/00 ,  G03F7/00 ,  B29C43/14 ,  B29C43/04

CPC classification number: G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20210096468A1

公开(公告)日：2021-04-01

申请号：US17120506

申请日：2020-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20160377997A1

公开(公告)日：2016-12-29

申请号：US15258903

申请日：2016-09-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Andre Bernardus JEUNINK ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN

IPC: G03F9/00 ,  G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7042

Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

Abstract translation: 公开了一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。

公开(公告)号：US20160195823A1

公开(公告)日：2016-07-07

申请号：US15046284

申请日：2016-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela KRUIJT-STEGEMAN ,  Andre Bernardus Jeunink ,  Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Frederik Dijksman ,  Carolus Johannes Catharina Schoormans ,  Adrianus Hendrik Koevoets ,  Catharinus De Schiffart ,  Sander Frederik Wuister

IPC: G03F9/00 ,  G03F7/00

Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Abstract translation: 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。

公开(公告)号：US20230221651A1

公开(公告)日：2023-07-13

申请号：US18124350

申请日：2023-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/00

CPC classification number: G03F7/7035 ,  G03F7/709 ,  G03F9/7042 ,  G03F7/70825 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/0002

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20140291879A1

公开(公告)日：2014-10-02

申请号：US14304662

申请日：2014-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela KRUIJT-STEGEMAN ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract translation: 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。