公开(公告)号：US20230091648A1

公开(公告)日：2023-03-23

申请号：US18070155

申请日：2022-11-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier DERKS ,  Daniel Jozef Maria DIRECKS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Pieter Gerardus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US20160306283A1

公开(公告)日：2016-10-20

申请号：US15196120

申请日：2016-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER ,  Danny Maria Hubertus PHILIPS ,  Michel RIEPEN ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Adrianes Johannes BAETEN ,  Fabrizio EVANGELISTA

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70991

Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Abstract translation: 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US20250021026A1

公开(公告)日：2025-01-16

申请号：US18711842

申请日：2022-11-18

Applicant: ASML Netherlands B.V.

Inventor： William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN ,  Daniel Jozef Maria DIRECKS ,  Johannes Henricus Wilhelmus JACOBS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Edwin Johan BUIS ,  Bart Leonardus KNAPEN ,  Nicolaas Johannes Wilhelmus REUVERS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G03F7/00 ,  H05G2/00

Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a first reservoir, a pressurizing system configured to pressurize a hydraulic fluid, and a separating device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer a pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying liquid target material to a radiation source.